Recommended reading list of early publications on atomic layer deposition-Outcome of the "Virtual Project on the History of ALD"

Article/chapterEnglish2017

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American Vacuum Society,2017
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LIBRIS-ID:oai:DiVA.org:uu-316208
https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-316208URI
https://doi.org/10.1116/1.4971389DOI
https://lup.lub.lu.se/record/40443c54-6e7a-4ea5-bf48-fa04b49ab7cbURI
https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-134496URI

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Language:English
Summary in:English

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Subject category:ref swepub-contenttype
Subject category:for swepub-publicationtype

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Funding Agencies|Finnish Centre of Excellence in Atomic Layer Deposition by Academy of Finland; COST (European Cooperation in Science and Technology) [MP1402]
Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.

Subject headings and genre

NATURVETENSKAP Fysik Atom- och molekylfysik och optik hsv//swe
NATURAL SCIENCES Physical Sciences Atom and Molecular Physics and Optics hsv//eng
NATURVETENSKAP Kemi Materialkemi hsv//swe
NATURAL SCIENCES Chemical Sciences Materials Chemistry hsv//eng
NATURVETENSKAP Kemi Oorganisk kemi hsv//swe
NATURAL SCIENCES Chemical Sciences Inorganic Chemistry hsv//eng

Added entries (persons, corporate bodies, meetings, titles ...)

Akbashev, Andrew R.Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA.,Aalto University, Espoo, Finland,Stanford University, CA 94305 USA (author)
Ali, SaimaAalto Univ, Sch Chem Technol, Dept Mat Sci & Engn, POB 16200, FI-00076 Aalto, Finland.,Aalto University, Finland (author)
Bechelany, MikhaelUniv Montpellier, ENSCM, CNRS, IEM,UMR 5635, Pl Eugene Bataillon, F-34095 Montpellier 5, France.,University of Montpellier, France (author)
Berdova, MariaUniv Twente, Ind Focus Grp XUV Opt, NL-7522 ND Enschede, Netherlands.,University of Twente, Netherlands (author)
Boyadjiev, StefanBulgarian Acad Sci, Inst Solid State Phys, 72 Tzarigradsko Chaussee Blvd, Sofia 1784, Bulgaria.,Bulgarian Academic Science, Bulgaria (author)
Cameron, David C.Masaryk Univ, CEPLANT, Kotlarska 267-2, CS-61137 Brno, Czech Republic.,Masaryk University, Czech Republic (author)
Chen, RongHuazhong Univ Sci & Technol, Sch Mech Sci & Engn, Sch Opt & Elect Informat, 1037 Luoyu Rd, Wuhan 430074, Hubei, Peoples R China.,Huazhong University of Science and Technology, Peoples R China (author)
Chubarov, MikhailUniv Grenoble Alpes, CNRS, SIMAP, F-38000 Grenoble, France.,University of Grenoble Alpes, France (author)
Cremers, VeroniqueUniv Ghent, CoCooN, Dept Solid State Sci, Krijgslaan 281-S1, B-9000 Ghent, Belgium.,University of Ghent, Belgium (author)
Devi, AnjanaRuhr Univ Bochum, Inorgan Mat Chem, D-44801 Bochum, Germany.,Ruhr University of Bochum, Germany (author)
Drozd, ViktorSt Petersburg State Univ, Inst Chem, Univ Skaya Emb 7-9, St Petersburg 199034, Russia.,St Petersburg State University, Russia (author)
Elnikova, LiliyaInst Theoret & Expt Phys, Bolshaya Cheremushkinskaya 25, Moscow 117218, Russia.,Institute Theoret and Expt Phys, Russia (author)
Gottardi, GloriaFdn Bruno Kessler, Ctr Mat & Microsyst, I-38123 Trento, Italy. (author)
Grigoras, KestutisVTT Tech Res Ctr Finland, POB 1000,Tietotie 3, FI-02044 Espoo, Vtt, Finland.,VTT Technical Research Centre Finland, Finland (author)
Hausmann, Dennis M.Lam Res Corp, Tualatin, OR 97062 USA.,Lam Research Corp, OR 97062 USA (author)
Hwang, Cheol SeongSeoul Natl Univ, Dept Mat Sci & Engn, Coll Engn, Seoul 08826, South Korea.;Seoul Natl Univ, Interuniv Semicond Res Ctr, Coll Engn, Seoul 08826, South Korea.,Seoul National University, South Korea; Seoul National University, South Korea (author)
Jen, Shih-HuiGlobalfoundries, Albany, NY 12203 USA. (author)
Kallio, TanjaAalto Univ, Sch Chem Engn, Dept Chem, POB 16100, FI-00076 Aalto, Finland.,Aalto University, Finland (author)
Kanervo, JaanaAalto Univ, Sch Chem Engn, Dept Chem, POB 16100, FI-00076 Aalto, Finland.;Abo Akad Univ, FI-20500 Turku, Finland.,Åbo Akademi University,Aalto University, Finland; Abo Akad University, Finland (author)
Khmelnitskiy, IvanSt Petersburg Electrotech Univ LETI, Res & Educ Ctr Nanotechnol, Ul Prof Popova 5, St Petersburg 197376, Russia.,St Petersburg Electrotech University of LETI, Russia (author)
Kim, Do HanMIT, Dept Chem Engn, 77 Massachusetts Ave, Cambridge, MA 02139 USA.,Massachusetts Institute of Technology (author)
Klibanov, LevTechinsights, 3000 Solandt Rd, Ottawa, ON K2K2X2, Canada. (author)
Koshtyal, YuryIoffe Inst, Lab Lithium Ion Technol, 26 Politekhnicheskaya, St Petersburg 194021, Russia.,Ioffe Institute, Russia (author)
Krause, A. Outi I.Aalto Univ, Sch Chem Technol, Dept Mat Sci & Engn, POB 16200, FI-00076 Aalto, Finland.,Aalto University, Finland (author)
Kuhs, JakobUniv Ghent, CoCooN, Dept Solid State Sci, Krijgslaan 281-S1, B-9000 Ghent, Belgium.,University of Ghent, Belgium (author)
Kaerkkaenen, IrinaSentech Instruments GmbH, Schwarzschildstr 2, D-12489 Berlin, Germany. (author)
Kaariainen, Marja-LeenaNovaldMed Ltd Oy, Telkantie 5, FI-82500 Kitee, Finland.,NovaldMedical Ltd Oy, Finland (author)
Kaariainen, TommiNovaldMed Ltd Oy, Telkantie 5, FI-82500 Kitee, Finland.;Univ Helsinki, Inorgan Chem Lab, POB 55,AI Virtasen Aukio 1, FI-00014 Helsinki, Finland.,NovaldMedical Ltd Oy, Finland; University of Helsinki, Finland (author)
Lamagna, LucaSTMicroelectronics, Via C Olivetti 2, I-20864 Agrate Brianza, MB, Italy.,VTT Technical Research Centre Finland, Finland (author)
Lapicki, Adam A.Seagate Technol Ireland, 1 Disc Dr, Derry BT48 7BD, North Ireland.,Seagate Technology Ireland, North Ireland (author)
Leskela, MarkkuUniv Helsinki, Dept Chem, POB 55, FI-00014 Helsinki, Finland.,University of Helsinki, Finland (author)
Lipsanen, HarriAalto Univ, Dept Micro & Nanosci, Tietotie 3, Espoo 02150, Finland.,Aalto University, Finland (author)
Lyytinen, JussiAalto Univ, Sch Chem Technol, Dept Mat Sci & Engn, POB 16200, FI-00076 Aalto, Finland.,Aalto University, Finland (author)
Malkov, AnatolyTech Univ, St Petersburg State Inst Technol, Dept Chem Nanotechnol & Mat Elect, 26 Moskovsky Prosp, St Petersburg 190013, Russia.,Technical University, Russia (author)
Malygin, AnatolyTech Univ, St Petersburg State Inst Technol, Dept Chem Nanotechnol & Mat Elect, 26 Moskovsky Prosp, St Petersburg 190013, Russia.,Technical University, Russia (author)
Mennad, AbdelkaderCDER, UDES, RN 11 BP 386 Bou Ismail, Tipasa 42415, Algeria. (author)
Militzer, ChristianTech Univ Chemnitz, Inst Chem, Phys Chem, Str Nationen 62, D-09111 Chemnitz, Germany.,Chemnitz University of Technology,Technical University of Chemnitz, Germany (author)
Molarius, JyrkiSumma Semicond Oy, PL 11, Espoo 02131, Finland. (author)
Norek, MalgorzataMil Univ Technol, Fac Adv Technol & Chem, Dept Adv Mat & Technol, Str Kaliskiego 2, PL-00908 Warsaw, Poland.,Mil University of Technology, Poland (author)
Ozgit-Akgun, CaglaASELSAN Inc, Microelect Guidance & Electroopt Business Sect, TR-06750 Ankara, Turkey. (author)
Panov, MikhailSt Petersburg Electrotech Univ LETI, Ctr Microtechnol & Diagnost, Ul Prof Popova 5, St Petersburg 197376, Russia.,St Petersburg Electrotech University of LETI, Russia (author)
Pedersen, HenrikLinköpings universitet,Linköping University,Kemi,Tekniska fakulteten(Swepub:liu)henpe50 (author)
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Popov, GeorgiUniv Helsinki, Dept Chem, POB 55, FI-00014 Helsinki, Finland.,University of Helsinki, Finland (author)
Puurunen, Riikka L.VTT Tech Res Ctr Finland, POB 1000,Tietotie 3, FI-02044 Espoo, Vtt, Finland. (author)
Rampelberg, GeertUniv Ghent, CoCooN, Dept Solid State Sci, Krijgslaan 281-S1, B-9000 Ghent, Belgium.,University of Ghent, Belgium (author)
Ras, Robin H. A. (author)
Rauwel, ErwanTallinn Univ Technol, Tartu Coll, Puiestee 78, EE-51008 Tartu, Estonia.,Tallinn University of Technology, Estonia (author)
Roozeboom, FredEindhoven Univ Technol, Dept Appl Phys, Grp Plasma & Mat Proc, POB 513, NL-5600 MB Eindhoven, Netherlands.;TNO, High Tech Campus 21, NL-5656 AE Eindhoven, Netherlands.,Netherlands Organisation for Applied Scientific Research (Utrecht),Eindhoven University of Technology, Netherlands; TNO, Netherlands (author)
Sajavaara, TimoUniv Jyvaskyla, Dept Phys, POB 35, Jyvaskyla 40014, Finland.,University of Jyvaskyla, Finland (author)
Salami, HosseinUniv Maryland, Dept Chem & Biomol Engn, College Pk, MD 20742 USA.,University of Maryland, MD 20742 USA (author)
Savin, HeleAalto Univ, Dept Micro & Nanosci, Tietotie 3, Espoo 02150, Finland.,Aalto University, Finland (author)
Schneider, NathanaelleIRDEP CNRS, 6 Quai Watier, F-78401 Chatou, France.;IPVF, 8 Rue Renaissance, F-92160 Antony, France. (author)
Seidel, Thomas E.Seitek50, POB 350238, Palm Coast, FL 32135 USA. (author)
Sundqvist, JonasFraunhofer Inst Ceram Technol & Syst IKTS, Syst Integrat & Technol Transfer, Winterbergstr 28, D-01277 Dresden, Germany.,Fraunhofer Institute for Ceramic Technologies and Systems IKTS,Fraunhofer Institute Ceram Technology and Syst IKTS, Germany(Swepub:lu)ftf-jsv (author)
Suyatin, Dmitry B.Lund University,Lunds universitet,NanoLund: Centre for Nanoscience,Annan verksamhet, LTH,Lunds Tekniska Högskola,Fasta tillståndets fysik,Fysiska institutionen,Institutioner vid LTH,Other operations, LTH,Faculty of Engineering, LTH,Solid State Physics,Department of Physics,Departments at LTH,Faculty of Engineering, LTH,Lund University, Sweden; Lund University, Sweden(Swepub:lu)ftf-dsu (author)
Törndahl, TobiasUppsala University,Uppsala universitet,Fasta tillståndets elektronik,Uppsala University, Sweden(Swepub:uu)totor079 (author)
van Ommen, J. RuudDelft Univ Technol, Dept Chem Engn, Van der Maasweg 9, NL-2629 HZ Delft, Netherlands.,Delft University of Technology, Netherlands (author)
Wiemer, ClaudiaCNR, IMM, Lab MDM, Via C Olivetti 2, I-20864 Agrate Brianza, MB, Italy. (author)
Ylivaara, Oili M. E.VTT Tech Res Ctr Finland, POB 1000,Tietotie 3, FI-02044 Espoo, Vtt, Finland.,VTT Technical Research Centre Finland, Finland (author)
Yurkevich, OksanaImmanuel Kant Balt Fed Univ, Res & Educ Ctr Funct Nanomat, A Nevskogo 14, Kaliningrad 236041, Russia.,Immanuel Kant Balt Federal University, Russia (author)
Aalto Univ, Dept Chem, POB 16100, FI-00076 Espoo, Finland.Aalto University, Finland (creator_code:org_t)

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In:Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films: American Vacuum Society35:10734-21011520-8559

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