Anomalous diffusion of ions in electrochromic tungsten oxide films

• Amorphous tungsten oxide thinfilms were deposited by sputtering at different O2/Ar ratios onto conducting substrates. Ion intercalation and diffusion in thefilms was studied by electrochemical impedance spectroscopy measurements in the frequency range 10 mHz–100 kHz and for potentials between 1.0 and 3.2 V vs. Li/Li+, using the film as working electrode in a Li+ containing electrolyte. The impedance data were in very good agreement with anomalous diffusion models. Different models were found to be applicable at potentials >1.8 V and <1.8 V. At high potentials ion intercalation was found to be reversible and an anomalous diffusion model describing ion hopping was favored. At low potentials ion intercalation was found to be irreversible and ion trapping takes place. In this latter range an anomalous diffusion model for the case of non-conserved number of charge carriers gave the best fit to experimentaldata. We obtained potential dependent diffusion coefficients in the range from 109 to 1011cm2/s, and anomalous diffusion exponents in the range 0.1 to 0.4, with the films deposited at lower O2/Ar ratios exhibiting the higher values.

Ämnesord

TEKNIK OCH TEKNOLOGIER  -- Materialteknik (hsv//swe)

ENGINEERING AND TECHNOLOGY  -- Materials Engineering (hsv//eng)

Nyckelord

Electrochromism impedance spectroscopy anomalous diffusion tungsten oxide

Engineering Science with specialization in Solid State Physics

Teknisk fysik med inriktning mot fasta tillståndets fysik

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