A Sequential Process of Graphene Exfoliation and Site-Selective Copper/Graphene Metallization Enabled by Multifunctional 1-Pyrenebutyric Acid Tetrabutylammonium Salt

• This paper reports a procedure leading to shear exfoliation of pristine few-layer graphene flakes in water and subsequent site-selective formation of Cu/graphene films on polymer substrates, both of which are enabled by employing the water soluble 1-pyrenebutyric acid tetrabutylammonium salt (PyB-TBA). The exfoliation with PyB-TBA as an enhancer leads to as-deposited graphene films dried at 90 °C that are characterized by electrical conductivity of ∼110 S/m. Owing to the good affinity of the tetrabutylammonium cations to the catalyst PdCl42–, electroless copper deposition selectively in the graphene films is initiated, resulting in a self-aligned formation of highly conductive Cu/graphene films at room temperature. The excellent solution-phase and low-temperature processability, self-aligned copper growth, and high electrical conductivity of the Cu/graphene films have permitted fabrication of several electronic circuits on plastic foils, thereby indicating their great potential in compliant, flexible, and printed electronics.

Ämnesord

NATURVETENSKAP  -- Kemi -- Materialkemi (hsv//swe)

NATURAL SCIENCES  -- Chemical Sciences -- Materials Chemistry (hsv//eng)

Nyckelord

graphene

electroless copper deposition

solution-phase processing

self-aligned metallization

flexible electronics

Engineering Science with specialization in Nanotechnology and Functional Materials

Publikations- och innehållstyp

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