Microstructure and phase composition of the Ag-Al film wear track: Through-thickness characterization by advanced electron microscopy

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Kryshtal, O.AGH Univ Sci & Technol, Int Ctr Electron Microscopy Mat Sci, Comp Sci, Al Mickiewicza 30, PL-30059 Krakow, Poland;AGH Univ Sci & Technol, Fac Met Engn & Ind, Comp Sci, Al Mickiewicza 30, PL-30059 Krakow, Poland (författare)

Microstructure and phase composition of the Ag-Al film wear track : Through-thickness characterization by advanced electron microscopy

Analytical transmission electron microscopy has been applied to characterize the microstructure, phase and chemical composition of the Ag-Al wear track throughout its thickness down to the atomic level. Microscopy findings have been correlated with Ag-Al film tribological properties to understand the effect of the hexagonal solid solution phase on the tribological properties of this film. Ag-25Al (at.%) films have been produced by simultaneous magnetron sputtering of components in Ar atmosphere under 1 mTorr pressure and subjected to pin-on-disc tribological tests. It has been shown that hcp phase with (001) planes aligned parallel to the film surface dominates both in as-deposited and in tribofilm areas of the Ag-Al alloy film. Possible mechanisms of reduced friction in easily oxidized Ag-Al system are discussed and the mechanism based on readily shearing basal planes of the hcp phase is considered as the most probable one.

Kruk, A.AGH Univ Sci & Technol, Int Ctr Electron Microscopy Mat Sci, Comp Sci, Al Mickiewicza 30, PL-30059 Krakow, Poland;AGH Univ Sci & Technol, Fac Met Engn & Ind, Comp Sci, Al Mickiewicza 30, PL-30059 Krakow, Poland (författare)
Mao, FangUppsala universitet,Oorganisk kemi(Swepub:uu)fanma224 (författare)
Taher, MamounUppsala universitet,Oorganisk kemi,Corp Res, Insulat & Mat Technol, Abb Ab, Vasteras, Sweden(Swepub:uu)mamta866 (författare)
Jansson, Ulf,1960-Uppsala universitet,Oorganisk kemi(Swepub:uu)uja03434 (författare)
Czyrska-Filemonowicz, A.AGH Univ Sci & Technol, Int Ctr Electron Microscopy Mat Sci, Comp Sci, Al Mickiewicza 30, PL-30059 Krakow, Poland;AGH Univ Sci & Technol, Fac Met Engn & Ind, Comp Sci, Al Mickiewicza 30, PL-30059 Krakow, Poland (författare)
AGH Univ Sci & Technol, Int Ctr Electron Microscopy Mat Sci, Comp Sci, Al Mickiewicza 30, PL-30059 Krakow, Poland;AGH Univ Sci & Technol, Fac Met Engn & Ind, Comp Sci, Al Mickiewicza 30, PL-30059 Krakow, PolandOorganisk kemi (creator_code:org_t)

Ingår i:Archives of Metallurgy and Materials: POLSKA AKAD NAUK, POLISH ACAD SCIENCES, INST METALL & MATER SCI PAS64:1, s. 251-2561733-34902300-1909

Av författaren/redakt...: Kryshtal, O.; Kruk, A.; Mao, Fang; Taher, Mamoun; Jansson, Ulf, 19 ...; Czyrska-Filemono ...

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