Effect of nitrogen vacancies on the growth, dislocation structure, and decomposition of single crystal epitaxial (Ti1-xAlx)N-y thin films

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Calamba, KatherineLinköpings universitet,Nanostrukturerade material,Tekniska fakulteten,Univ Lorraine, France; Sandvik Coromant AB, Sweden (author)

Effect of nitrogen vacancies on the growth, dislocation structure, and decomposition of single crystal epitaxial (Ti1-xAlx)N-y thin films

Article/chapterEnglish2021

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Elsevier,2021
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LIBRIS-ID:oai:DiVA.org:uu-433419
https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-433419URI
https://doi.org/10.1016/j.actamat.2020.116509DOI
https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-172935URI

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Language:English
Summary in:English

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Funding Agencies|European Unions Erasmus Mundus doctoral program in Materials Science and Engineering (DocMASE)European Union (EU); Swedish Research CouncilSwedish Research Council [2017-03813, 2017-06701]; Swedish government strategic research area grant AFM - SFO MatLiU [2009-00971]; VINNOVA (FunMat-II project)Vinnova [2016-05156]
The effect of varying nitrogen vacancies on the growth, microstructure, spinodal decomposition and hardness values of predominantly single crystal cubic phase c-(Ti1-xAlx)N-y films was investigated. Epitaxial c-(Ti1-xAlx)N-y films with y = 0.67, 0.79, and 0.92 were grown on MgO(001) and MgO(111) substrates by magnetron sputter deposition. High N vacancy c-(Ti1-xAlx)N-0.67 films deposited on MgO(111) contained coherently oriented w-(0001) structures while segregated conical structures were observed on the films grown on MgO(001). High resolution STEM images revealed that the N-deficient growth conditions induced segregation with small compositional fluctuations that increase with the number of N vacancies. Similarly, strain map analysis of the epitaxial c-(Ti1-xAlx)N-y (001) and (111) films show fluctuations in strain concentration that scales with the number of N vacancies and increases during annealing. The spinodal decomposition coarsening rate of the epitaxial c-(Ti1-xAlx)N-y films was observed to increase with decreasing N vacancies. Nanoindentation showed decreasing trends in hardness of the as-deposited films as the N vacancies increase. Isothermal post-anneal at 1100 degrees C in vacuum for 120 min revealed a continuation in the increase in hardness for the film with the largest number of N vacancies (y = 0.67) while the hardness decreased for the films with y = 0.79 and 0.92. These results suggest that nitrogen-deficient depositions of c-(Ti1-xAlx)N-y films help to promote a self-organized phase segregation, while higher N vacancies generally increase the coherency strain which delays the coarsening process and can influence the hardness at high temperatures.

Subject headings and genre

TEKNIK OCH TEKNOLOGIER Materialteknik Metallurgi och metalliska material hsv//swe
ENGINEERING AND TECHNOLOGY Materials Engineering Metallurgy and Metallic Materials hsv//eng
TEKNIK OCH TEKNOLOGIER Materialteknik Annan materialteknik hsv//swe
ENGINEERING AND TECHNOLOGY Materials Engineering Other Materials Engineering hsv//eng
Thin Films
Nitrogen vacancies
TiAlN system
spinodal decomposition

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Salamania, Janella,1992-Linköpings universitet,Nanostrukturerade material,Tekniska fakulteten,Sandvik Coromant AB, Sweden(Swepub:liu)jansa11 (author)
Johansson, Mats P.,1965-Linköpings universitet,Nanostrukturerade material,Tekniska fakulteten,SECO Tools AB, Sweden(Swepub:liu)matjo02 (author)
Johnson, L. J. S.Sandvik Coromant AB, SE-12679 Stockholm, Sweden. (author)
Boyd, Robert,1972-Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten(Swepub:liu)robbo87 (author)
Pierson, J. F.Univ Lorraine, IJL, CNRS, F-54000 Nancy, France. (author)
Sortica, Mauricio A.Uppsala universitet,Tandemlaboratoriet,Uppsala Univ, Sweden(Swepub:uu)mauso471 (author)
Primetzhofer, DanielUppsala universitet,Tillämpad kärnfysik,Tandemlaboratoriet,Uppsala Univ, Sweden(Swepub:uu)danpr521 (author)
Odén, Magnus,1965-Linköpings universitet,Nanostrukturerade material,Tekniska fakulteten(Swepub:liu)magod41 (author)
Linköpings universitetNanostrukturerade material (creator_code:org_t)

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In:Acta Materialia: Elsevier2031359-64541873-2453

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