(WFRF:(Zhang John))
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Measurements of Si ion stopping in amorphous silicon
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- Whitlow, Harry J (author)
- Uppsala universitet,Institutionen för materialvetenskap,ION PHYSICS
- Timmer, Heiko (author)
- Elliman, Robert G (author)
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- Weijers, Tessica D M (author)
- Zhang, Yanwen (author)
- Uribastera, Juan (author)
- O´Connor, D John (author)
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- (creator_code:org_t)
- 2002
- 2002
- English.
- In: Nucl Instrum Methods Phys Res. ; B:190, s. 84-88
- Journal article (peer-reviewed)
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Subject headings
- TEKNIK OCH TEKNOLOGIER -- Materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering (hsv//eng)
Keyword
- Materials science
- Teknisk materialvetenskap
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- ref (subject category)
- art (subject category)
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- ENGINEERING AND TECHNOLOGY
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- Uppsala University
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