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Influence of Metal ...
Influence of Metal Substitution and Ion Energy on Microstructure Evolution of High-Entropy Nitride (TiZrTaMe)N1-x (Me = Hf, Nb, Mo, or Cr) Films
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- Shu, Rui, 1990- (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Lundin, Daniel, 1980- (author)
- Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten,Univ Paris Saclay, France
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- Xin, Binbin, 1989- (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Sortica, Mauricio A. (author)
- Uppsala universitet,Tandemlaboratoriet,Uppsala Univ, Sweden
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- Primetzhofer, Daniel (author)
- Uppsala universitet,Tillämpad kärnfysik,Tandemlaboratoriet,Uppsala Univ, Sweden; Uppsala Univ, Sweden
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- Magnuson, Martin, 1965- (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Le Febvrier, Arnaud, Assistant Professor, 1986- (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Eklund, Per, Docent, 1977- (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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(creator_code:org_t)
- 2021-05-19
- 2021
- English.
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In: ACS APPLIED ELECTRONIC MATERIALS. - : American Chemical Society (ACS). - 2637-6113. ; 3:6, s. 2748-2756
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Abstract
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- Multicomponent or high-entropy ceramics show unique combinations of mechanical, electrical, and chemical properties of importance in coating applications. However, generalizing controllable thin-film processes for these complex materials remains a challenge. Here, understoichiometric (TiZrTaMe)N1-x (Me = Hf, Nb, Mo, or Cr, 0.12 <= x <= 0.30) films were deposited on Si(100) substrates at 400 degrees C by reactive magnetron sputtering using single elemental targets. The influence of ion energy during film growth was investigated by varying the negative substrate bias voltage from similar to 10 V (floating potential) to 130 V. The nitrogen content for the samples determined by elastic recoil detection analysis varied from 34.9 to 43.8 at. % (0.12 <= x <= 0.30), and the metal components were near-equimolar and not affected by the bias voltage. On increasing the substrate bias, the phase structures of (TiZrTaMe)N1-x (Me = Hf, Nb, or Mo) films evolved from a polycrystalline fcc phase to a (002) preferred orientation along with a change in surface morphology from faceted triangular features to a dense and smooth structure with nodular mounds. All the four series of (TiZrTaMe)N1-x (Me = Hf, Nb, Mo, or Cr) films exhibited increasing intrinsic stress with increasing negative bias. The maximum compressive stress reached similar to 3.1 GPa in Hf- and Cr-containing films deposited at -130 V. The hardness reached a maximum value of 28.0 +/- 1.0 GPa at a negative bias >= 100 V for all the four series of films. The effect of bias on the mechanical properties of (TiNbZrMe)N1-x films can thus guide the design of protective high-entropy nitride films.
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Materialteknik -- Annan materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering -- Other Materials Engineering (hsv//eng)
- NATURVETENSKAP -- Kemi -- Materialkemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Materials Chemistry (hsv//eng)
Keyword
- high-entropy alloy
- understoichiometry
- texture
- residual stress
- hardness
Publication and Content Type
- ref (subject category)
- art (subject category)
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Shu, Rui, 1990-
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Lundin, Daniel, ...
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Xin, Binbin, 198 ...
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Sortica, Maurici ...
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Primetzhofer, Da ...
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Magnuson, Martin ...
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Le Febvrier, Arn ...
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Eklund, Per, Doc ...
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- About the subject
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- ENGINEERING AND TECHNOLOGY
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ENGINEERING AND ...
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and Materials Engine ...
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and Other Materials ...
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- NATURAL SCIENCES
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NATURAL SCIENCES
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and Chemical Science ...
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and Materials Chemis ...
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ACS APPLIED ELEC ...
- By the university
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Uppsala University
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Linköping University