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Cu(In,Ga)Se2 based ultrathin solar cells the pathway from lab rigid to large scale flexible technology

Lopes, T. S. (author)
Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.;Hasselt Univ, imo imomec, Martelarenlaan 42, B-3500 Hasselt, Belgium.;Imec, imo imomec, Thor Pk 8320, B-3600 Genk, Belgium.;EnergyVille, imo imec, 3600, B-8320 Genk, Belgium.
Teixeira, J. P. (author)
Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.
Curado, M. A. (author)
Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.;Univ Coimbra, Dept Phys, CFisUC, P-3004516 Coimbra, Portugal.
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Ferreira, B. R. (author)
Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.
Oliveira, A. J. N. (author)
Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.;Campus Univ St iago, Univ Aveiro, Dept Fis, P-3810193 Aveiro, Portugal.;Campus Univ St iago, Univ Aveiro, i3N, P-3810193 Aveiro, Portugal.
Cunha, J. M. V. (author)
Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.;Campus Univ St iago, Univ Aveiro, Dept Fis, P-3810193 Aveiro, Portugal.;Campus Univ St iago, Univ Aveiro, i3N, P-3810193 Aveiro, Portugal.
Monteiro, M. (author)
Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.
Violas, A. (author)
Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.;Campus Univ St iago, Univ Aveiro, Dept Fis, P-3810193 Aveiro, Portugal.;Campus Univ St iago, Univ Aveiro, i3N, P-3810193 Aveiro, Portugal.
Barbosa, J. R. S. (author)
Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.
Sousa, P. C. (author)
Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.
Caha, I. (author)
Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.
Borme, J. (author)
Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.
Oliveira, K. (author)
Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.
Ring, J. (author)
Obducat AB, Medicon Village, S-22363 Lund, Sweden.
Chen, Wei-Chao (author)
Uppsala universitet,Solcellsteknik
Zhou, Y. (author)
Obducat AB, Medicon Village, S-22363 Lund, Sweden.
Takei, K. (author)
Midsummer AB, Elektronikhojden 6, S-17543 Jarfalla, Sweden.
Niemi, E. (author)
Midsummer AB, Elektronikhojden 6, S-17543 Jarfalla, Sweden.
Deepak, F. L. (author)
Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.
Edoff, Marika, 1965- (author)
Uppsala universitet,Solcellsteknik
Brammertz, G. (author)
Hasselt Univ, imo imomec, Martelarenlaan 42, B-3500 Hasselt, Belgium.;Imec, imo imomec, Thor Pk 8320, B-3600 Genk, Belgium.;EnergyVille, imo imec, 3600, B-8320 Genk, Belgium.
Fernandes, P. A. (author)
Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.;Campus Univ St iago, Univ Aveiro, i3N, P-3810193 Aveiro, Portugal.;Inst Super Engn Porto, Inst Politecn Porto, Dept Fis, CIETI, P-4200072 Porto, Portugal.
Vermang, B. (author)
Hasselt Univ, imo imomec, Martelarenlaan 42, B-3500 Hasselt, Belgium.;Imec, imo imomec, Thor Pk 8320, B-3600 Genk, Belgium.;EnergyVille, imo imec, 3600, B-8320 Genk, Belgium.
Salome, P. M. P. (author)
Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.;Campus Univ St iago, Univ Aveiro, Dept Fis, P-3810193 Aveiro, Portugal.
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Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal;Hasselt Univ, imo imomec, Martelarenlaan 42, B-3500 Hasselt, Belgium.;Imec, imo imomec, Thor Pk 8320, B-3600 Genk, Belgium.;EnergyVille, imo imec, 3600, B-8320 Genk, Belgium. Int Iberian Nanotechnol Lab, INL, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal. (creator_code:org_t)
2023-02-02
2023
English.
In: npj Flexible Electronics. - : Springer Nature. - 2397-4621. ; 7:1
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • The incorporation of interface passivation structures in ultrathin Cu(In,Ga)Se2 based solar cells is shown. The fabrication used an industry scalable lithography technique—nanoimprint lithography (NIL)—for a 15 × 15 cm2 dielectric layer patterning. Devices with a NIL nanopatterned dielectric layer are benchmarked against electron-beam lithography (EBL) patterning, using rigid substrates. The NIL patterned device shows similar performance to the EBL patterned device.The impact of the lithographic processes in the rigid solar cells’ performance were evaluated via X-ray Photoelectron Spectroscopy and through a Solar Cell Capacitance Simulator. The device on stainless-steel showed a slightly lower performance than the rigid approach, due to additional challenges of processing steel substrates, even though scanning transmission electron microscopy did not show clear evidence of impurity diffusion. Notwithstanding, time-resolved photoluminescence results strongly suggested elemental diffusion from the flexible substrate. Nevertheless, bending tests on the stainless-steel device demonstrated the mechanical stability of the CIGS-based device.

Subject headings

TEKNIK OCH TEKNOLOGIER  -- Materialteknik -- Annan materialteknik (hsv//swe)
ENGINEERING AND TECHNOLOGY  -- Materials Engineering -- Other Materials Engineering (hsv//eng)

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ref (subject category)
art (subject category)

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