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  • Lee, Wei ChuangUniv Zurich, Phys Inst, CH-8057 Zurich, Switzerland. (author)

Monolayer calibration of endofullerenes with x-ray absorption from implanted keV ion doses

  • Article/chapterEnglish2024

Publisher, publication year, extent ...

  • American Institute of Physics (AIP),2024
  • printrdacarrier

Numbers

  • LIBRIS-ID:oai:DiVA.org:uu-527894
  • https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-527894URI
  • https://doi.org/10.1116/6.0003302DOI

Supplementary language notes

  • Language:English
  • Summary in:English

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  • Subject category:ref swepub-contenttype
  • Subject category:art swepub-publicationtype

Notes

  • X-ray absorption spectroscopy (XAS) has the highest sensitivity for chemical element detection on surfaces. With this approach, small amounts of lanthanide-containing endofullerene molecules (Ho3N@C80) have been measured by total electron yield at a low flux bending magnet beamline. The monolayer coverage is calibrated by extrapolating the signals of constant doses (3 x 1014 cm-2) of Ho ions implanted into SiO2 with energies between 2 and 115 keV. At room temperature, the Ho XAS spectra of the molecules and implanted ions indicate trivalent but not identical Ho ground states. Still, this approach demonstrates a way for calibration of small coverages of molecules containing open core-shell elements.

Subject headings and genre

Added entries (persons, corporate bodies, meetings, titles ...)

  • Yu, LebinUniv Zurich, Phys Inst, CH-8057 Zurich, Switzerland. (author)
  • Oscarsson, Johan,1984-Uppsala universitet,Institutionen för fysik och astronomi(Swepub:uu)johos804 (author)
  • Ochapski, Michal W.Ist Italiano Tecnol, Graphene Labs, IT-16163 Genoa, Italy. (author)
  • Sagehashi, RyunosukeUniv Zurich, Phys Inst, CH-8057 Zurich, Switzerland. (author)
  • Zhang, YangLeibniz Inst Solid State & Mat Res IFW, D-01069 Dresden, Germany. (author)
  • Popov, Alexey A.Leibniz Inst Solid State & Mat Res IFW, D-01069 Dresden, Germany. (author)
  • Gebeyehu, Zewdu M.Ist Italiano Tecnol, Graphene Labs, IT-16163 Genoa, Italy. (author)
  • Martini, LeonardoIst Italiano Tecnol, Graphene Labs, IT-16163 Genoa, Italy. (author)
  • Forti, StivenIst Italiano Tecnol, Graphene Labs, IT-16163 Genoa, Italy. (author)
  • Coletti, CamillaIst Italiano Tecnol, Graphene Labs, IT-16163 Genoa, Italy. (author)
  • Delley, BernardPaul Scherrer Inst PSI, Swiss Light Source, CH-5232 Villigen, Switzerland. (author)
  • Muntwiler, MatthiasPaul Scherrer Inst PSI, Swiss Light Source, CH-5232 Villigen, Switzerland. (author)
  • Primetzhofer, DanielUppsala universitet,Institutionen för fysik och astronomi(Swepub:uu)danpr521 (author)
  • Greber, ThomasUniv Zurich, Phys Inst, CH-8057 Zurich, Switzerland. (author)
  • Univ Zurich, Phys Inst, CH-8057 Zurich, Switzerland.Institutionen för fysik och astronomi (creator_code:org_t)

Related titles

  • In:Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films: American Institute of Physics (AIP)42:20734-21011520-8559

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