Chemical vapour deposition of Cu2O and CuO from CuI and O-2 or N2O

• Thin films of CuO and Cu2O were deposited from CuI as the copper source and O-2 or N2O as the oxygen source. If O-2 was used, both CuO and Cu2O were obtained. Cu2O was deposited at low O-2 partial pressures (P-O2 <0.2 Torr) in a long isothermal hot wall

Nyckelord

chemical vapour deposition; copper oxides; THIN-FILMS; HALIDE PRECURSORS; CVD; OXIDE; PHASE; MORPHOLOGY; COPPER

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