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Investigation of th...
Investigation of the thermal stability of reactively sputter deposited TiN MOS gate electrodes
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LIBRIS-ID:oai:DiVA.org:uu-92225
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https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-92225URI
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Westlinder, JörgenUppsala universitet,Institutionen för teknikvetenskaper
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Olsson, Jörgen
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Uppsala universitetInstitutionen för teknikvetenskaper
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In:IEEE Transaction on electron devices
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