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Critical view on buffer layer formation and monolayer graphene properties in high-temperature sublimation

Stanishev, Vallery (författare)
Linköpings universitet,Linköping University,Halvledarmaterial,Tekniska fakulteten
Armakavicius, Nerijus (författare)
Linköpings universitet,Linköping University,Halvledarmaterial,Tekniska fakulteten
Bouhafs, Chamseddine (författare)
Linköpings universitet,Linköping University,Halvledarmaterial,Tekniska fakulteten
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Coletti, Camilla (författare)
Italian Institute of Technology,Ist Italiano Tecnol, Italy
Kuhne, Philipp (författare)
Linköpings universitet,Linköping University,Halvledarmaterial,Tekniska fakulteten
Ivanov, Ivan Gueorguiev (författare)
Linköpings universitet,Linköping University,Halvledarmaterial,Tekniska fakulteten
Zakharov, Alexei A. (författare)
Lund University,Lunds universitet,MAX IV-laboratoriet,MAX IV Laboratory,Lund Univ, Sweden
Yakimova, Rositsa (författare)
Linköpings universitet,Linköping University,Halvledarmaterial,Tekniska fakulteten
Darakchieva, Vanya (författare)
Linköpings universitet,Linköping University,Halvledarmaterial,Tekniska fakulteten
visa färre...
 (creator_code:org_t)
2021-02-21
2021
Engelska 16 s.
Ingår i: Applied Sciences (Switzerland). - : MDPI AG. - 2076-3417. ; 11:4, s. 1-16
  • Tidskriftsartikel (refereegranskat)
Abstract Ämnesord
Stäng  
  • In this work we have critically reviewed the processes in high-temperature sublimation growth of graphene in Ar atmosphere using closed graphite crucible. Special focus is put on buffer layer formation and free charge carrier properties of monolayer graphene and quasi-freestanding monolayer graphene on 4H–SiC. We show that by introducing Ar at higher temperatures, TAr, one can shift the formation of the buffer layer to higher temperatures for both n-type and semi-insulating substrates. A scenario explaining the observed suppressed formation of buffer layer at higher TAr is proposed and discussed. Increased TAr is also shown to reduce the sp3 hybridization content and defect densities in the buffer layer on n-type conductive substrates. Growth on semi-insulating substrates results in ordered buffer layer with significantly improved structural properties, for which TAr plays only a minor role. The free charge density and mobility parameters of monolayer graphene and quasi-freestanding monolayer graphene with different TAr and different environmental treatment conditions are determined by contactless terahertz optical Hall effect. An efficient annealing of donors on and near the SiC surface is suggested to take place for intrinsic monolayer graphene grown at 2000◦C, and which is found to be independent of TAr . Higher TAr leads to higher free charge carrier mobility parameters in both intrinsically n-type and ambient p-type doped monolayer graphene. TAr is also found to have a profound effect on the free hole parameters of quasi-freestanding monolayer graphene. These findings are discussed in view of interface and buffer layer properties in order to construct a comprehensive picture of high-temperature sublimation growth and provide guidance for growth parameters optimization depending on the targeted graphene application.

Ämnesord

NATURVETENSKAP  -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
NATURAL SCIENCES  -- Physical Sciences -- Condensed Matter Physics (hsv//eng)

Nyckelord

Buffer layer
Epitaxial graphene on SiC
Free charge carrier properties
High-temperature sublimation
Monolayer graphene
Quasi-free-standing graphene
Terahertz optical Hall effect
epitaxial graphene on SiC; buffer layer; quasi-free-standing graphene; monolayer graphene; high-temperature sublimation; terahertz optical Hall effect; free charge carrier properties

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