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Heteroepitaxially grown homojunction gallium oxide PN diodes using ion implantation technologies

Huang, Chih-Yang (author)
Natl Yang Ming Chiao Tung Univ, Taiwan
Tsai, Xin-Ying (author)
Natl Yang Ming Chiao Tung Univ, Taiwan
Tarntair, Fu-Gow (author)
Natl Yang Ming Chiao Tung Univ, Taiwan
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Langpoklakpam, Catherine (author)
Natl Yang Ming Chiao Tung Univ, Taiwan
Sao Ngo, Thien (author)
Natl Yang Ming Chiao Tung Univ, Taiwan
Wang, Pei-Jung (author)
Natl Yang Ming Chiao Tung Univ, Taiwan
Kao, Yu-Cheng (author)
Natl Chung Hsing Univ, Taiwan
Hsiao, Yi-Kai (author)
Hon Hai Res Inst, Taiwan
Tumilty, Niall (author)
Natl Yang Ming Chiao Tung Univ, Taiwan
Kuo, Hao-Chung (author)
Natl Yang Ming Chiao Tung Univ, Taiwan; Hon Hai Res Inst, Taiwan
Wu, Tian-Li (author)
Natl Yang Ming Chiao Tung Univ, Taiwan
Hsiao, Ching-Lien (author)
Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
Horng, Ray-Hua (author)
Natl Yang Ming Chiao Tung Univ, Taiwan
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 (creator_code:org_t)
ELSEVIER, 2024
2024
English.
In: Materials Today Advances. - : ELSEVIER. - 2590-0498. ; 22
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • Although advancements in n- and p-doping of gallium oxide (Ga2O3) are underway, the realization of functional pn diodes remains elusive. Here, we present the successful fabrication of a Ga2O3 pn diode utilizing ion implantation technology. The Ga2O3 epilayers were grown on c-plane sapphire substrates by metalorganic chemical vapor deposition (MOCVD). P-type conductivity Ga2O3 epilayer, confirmed by Hall effect analysis, was achieved by phosphorus (P) ion implantation followed with a rapid thermal annealing (RTA) process. This p-Ga2O3 epilayer reveals a significant reduction in resistivity (<10(6)) compared to undoped Ga2O3, demonstrating the successful inclusion and activation of P within the crystal lattice. X-ray diffraction analysis shows that the Ga2O3 epilayers were grown in high crystal quality. Although the crystallinity of Ga2O3 was slightly degraded after P ion implantation, the structure was recovered to high-quality crystal after RTA treatment. For the device structure, p-type Ga2O3 was formed first, followed n-type Ga2O3 regrowth to create a pn junction diode. The obtained results demonstrate a built-in voltage of 4.8 V, 4.2 V, and 4.308 V from simulation, fabricated pn diodes measured by I-V and C-V, respectively. A high breakdown voltage of 900 V was also obtained for the lateral pn diode grown on sapphire substrate. As concerning temperature stability, I-V curves of Ga2O3 pn diode were measured from 25 degrees C to 150 degrees C in steps of 25 degrees C. At elevated temperatures, for both forward and reverse biases, consecutive increasing currents were measured. These could be resulted from dominant diffusion and drift currents over recombination current at a given bias. In addition, the reverse current saturated (@V > 3kT/q) and remained very low at 2x10(-8) A, as the diode operated at 150 degrees C. The behavior could be due to Ga2O3 being a wide bandgap material.

Subject headings

NATURVETENSKAP  -- Kemi -- Materialkemi (hsv//swe)
NATURAL SCIENCES  -- Chemical Sciences -- Materials Chemistry (hsv//eng)

Publication and Content Type

ref (subject category)
art (subject category)

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