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  • Schönhense, G.Johannes-Gutenberg University Mainz (author)

Time-of-flight photoelectron momentum microscopy with 80-500 MHz photon sources : Electron-optical pulse picker or bandpass pre-filter

  • Article/chapterEnglish2021

Publisher, publication year, extent ...

  • 2021
  • 18 s.

Numbers

  • LIBRIS-ID:oai:lup.lub.lu.se:1f2a8fc0-3654-435c-a47e-6f8a73f9d52d
  • https://lup.lub.lu.se/record/1f2a8fc0-3654-435c-a47e-6f8a73f9d52dURI
  • https://doi.org/10.1107/S1600577521010511DOI

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  • Language:English
  • Summary in:English

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  • Subject category:art swepub-publicationtype
  • Subject category:ref swepub-contenttype

Notes

  • The small time gaps of synchrotron radiation in conventional multi-bunch mode (100-500 MHz) or laser-based sources with high pulse rate (∼80 MHz) are prohibitive for time-of-flight (ToF) based photoelectron spectroscopy. Detectors with time resolution in the 100 ps range yield only 20-100 resolved time slices within the small time gap. Here we present two techniques of implementing efficient ToF recording at sources with high repetition rate. A fast electron-optical beam blanking unit with GHz bandwidth, integrated in a photoelectron momentum microscope, allows electron-optical 'pulse-picking' with any desired repetition period. Aberration-free momentum distributions have been recorded at reduced pulse periods of 5 MHz (at MAX II) and 1.25 MHz (at BESSY II). The approach is compared with two alternative solutions: A bandpass pre-filter (here a hemispherical analyzer) or a parasitic four-bunch island-orbit pulse train, coexisting with the multi-bunch pattern on the main orbit. Chopping in the time domain or bandpass pre-selection in the energy domain can both enable efficient ToF spectroscopy and photoelectron momentum microscopy at 100-500 MHz synchrotrons, highly repetitive lasers or cavity-enhanced high-harmonic sources. The high photon flux of a UV-laser (80 MHz, <1 meV bandwidth) facilitates momentum microscopy with an energy resolution of 4.2 meV and an analyzed region-of-interest (ROI) down to <800 nm. In this novel approach to 'sub-μm-ARPES' the ROI is defined by a small field aperture in an intermediate Gaussian image, regardless of the size of the photon spot.

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  • Medjanik, K.Johannes-Gutenberg University Mainz(Swepub:lu)maxl-kma (author)
  • Fedchenko, O.Johannes-Gutenberg University Mainz (author)
  • Zymakova, A.Johannes-Gutenberg University Mainz (author)
  • Chernov, S.Johannes-Gutenberg University Mainz (author)
  • Kutnyakhov, D.Johannes-Gutenberg University Mainz (author)
  • Vasilyev, D.Johannes-Gutenberg University Mainz (author)
  • Babenkov, S.Johannes-Gutenberg University Mainz (author)
  • Elmers, H. J.Johannes-Gutenberg University Mainz (author)
  • Baumgärtel, P.Helmholtz Association of German Research Centers (author)
  • Goslawski, P.Helmholtz Association of German Research Centers (author)
  • Öhrwall, G.Lund University,Lunds universitet,MAX IV-laboratoriet,MAX IV Laboratory(Swepub:lu)maxl-goh (author)
  • Grunske, T.APE GmbH (author)
  • Kauerhof, T.APE GmbH (author)
  • Von Volkmann, K.APE GmbH (author)
  • Kallmayer, M.Surface Concept GmbH (author)
  • Ellguth, M.Surface Concept GmbH (author)
  • Oelsner, A.Surface Concept GmbH (author)
  • Johannes-Gutenberg University MainzHelmholtz Association of German Research Centers (creator_code:org_t)

Related titles

  • In:Journal of Synchrotron Radiation28, s. 1891-19080909-0495

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