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Characterization of...
Characterization of Trapping Effects Related to Carbon Doping Level in AlGaN Back-Barriers for AlGaN/GaN HEMTs
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- Castillo, Ragnar Ferrand Drake Del (författare)
- Chalmers University of Technology,Chalmers Univ Technol, Sweden
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- Chen, Ding Yuan (författare)
- SweGaN AB, S-58278 Linkoping, Sweden
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- Chen, Jr Tai (författare)
- SweGaN AB, S-58278 Linkoping, Sweden
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- Thorsell, Mattias (författare)
- Chalmers University of Technology,Chalmers Univ Technol, Sweden; SAAB AB, Sweden
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- Darakchieva, Vanya (författare)
- Linköpings universitet,Linköping University,Lund University,Lunds universitet,NanoLund: Centre for Nanoscience,Annan verksamhet, LTH,Lunds Tekniska Högskola,Fasta tillståndets fysik,Fysiska institutionen,Institutioner vid LTH,LTH profilområde: Nanovetenskap och halvledarteknologi,LTH profilområden,LU profilområde: Ljus och material,Lunds universitets profilområden,Other operations, LTH,Faculty of Engineering, LTH,Solid State Physics,Department of Physics,Departments at LTH,Faculty of Engineering, LTH,LTH Profile Area: Nanoscience and Semiconductor Technology,LTH Profile areas,Faculty of Engineering, LTH,LU Profile Area: Light and Materials,Lund University Profile areas,Halvledarmaterial,Tekniska fakulteten,Lund Univ, Sweden
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- Rorsman, Niklas (författare)
- Chalmers University of Technology,Chalmers Univ Technol, Sweden
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(creator_code:org_t)
- IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, 2024
- 2024
- Engelska 2 s.
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Ingår i: IEEE Transactions on Electron Devices. - : IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC. - 0018-9383 .- 1557-9646. ; , s. 0-1
- Relaterad länk:
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http://dx.doi.org/10...
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https://lup.lub.lu.s...
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https://doi.org/10.1...
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https://urn.kb.se/re...
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Abstract
Ämnesord
Stäng
- The impact of different carbon concentrations in the Al 0.06 Ga 0.94 N graded back-barrier and GaN buffer of high electron mobility transistors (HEMTs) is investigated. Four epi-wafers with different carbon concentrations, ranging from 1 × 10 17 to 5 × 10 17 cm −3 , were grown by metal organic chemical vapor deposition (MOCVD). HEMTs with 100 and 200 nm gate lengths were fabricated and characterized with dc, Pulsed-IV, drain current transient spectroscopy (DCTS), and large-signal measurements at 30 GHz. It is shown that the back-barrier effectively prevents buffer-related electron trapping. The highest C-doping provides the best 2DEG confinement, while lower carbon doping levels are beneficial for a high output power and efficiency. A C-doping of 1 × 10 17 cm −3 offers the highest output power at maximum power added efficiency (PAE) (1.8 W/mm), whereas 3 × 10 17 cm −3 doping provides the highest PAE ( > 40%). The C-profiles acquired by using secondary ion mass spectroscopy (SIMS), in combination with DCTS, is used to explain the electron trapping effects. Traps associated with the C-doping in the back-barrier are identified and the bias ranges for the trap activation are discussed. The study shows the importance of considering the C-doping level in the back-barrier of microwave GaN HEMTs for power amplification and generation.
Ämnesord
- NATURVETENSKAP -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Condensed Matter Physics (hsv//eng)
Nyckelord
- AlGaN/GaN
- Aluminum gallium nitride
- back-barrier
- dispersion
- double heterostructure
- Electrons
- Epitaxial growth
- HEMTs
- high electron mobility transistors (HEMTs)
- Logic gates
- MODFETs
- short channel effect (SCE)
- Wide band gap semiconductors
- MODFETs; HEMTs; Electrons; Logic gates; Wide band gap semiconductors; Aluminum gallium nitride; Epitaxial growth; AlGaN/GaN; back-barrier; dispersion; double heterostructure; high electron mobility transistors (HEMTs); short channel effect (SCE)
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- ref (ämneskategori)
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