SwePub
Sök i LIBRIS databas

  Extended search

L773:1520 8559 OR L773:0734 2101
 

Search: L773:1520 8559 OR L773:0734 2101 > (2010-2024) > Sideways deposition...

  • Hajihoseini, HamidrezaUniv Iceland, Sci Inst, IS-107 Reykjavik, Iceland.;Univ Paris Saclay, Univ Paris Sud, CNRS, UMR 8578,LPGP, F-91405 Orsay, France. (author)

Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering

  • Article/chapterEnglish2020

Publisher, publication year, extent ...

  • American Vacuum Society,2020
  • printrdacarrier

Numbers

  • LIBRIS-ID:oai:DiVA.org:kth-273496
  • https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-273496URI
  • https://doi.org/10.1116/1.5145292DOI
  • https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-165940URI

Supplementary language notes

  • Language:English
  • Summary in:English

Part of subdatabase

Classification

  • Subject category:ref swepub-contenttype
  • Subject category:art swepub-publicationtype

Notes

  • QC 20200525
  • Funding Agencies|University of Iceland Research Fund for Doctoral students; Czech Science FoundationGrant Agency of the Czech Republic [19-00579S]; Operational Program Research, Development and Education - European Structural and Investment Funds; Czech Ministry of Education, Youth and SportsMinistry of Education, Youth & Sports - Czech Republic [SOLID21 CZ.02.1.01/0.0/0.0/16 019/0000760]; Icelandic Research Fund [130029, 196141]
  • The sideways (radial) deposition rate and ionized flux fraction in a high power impulse magnetron sputtering (HiPIMS) discharge are studied and compared to a dc magnetron sputtering (dcMS) discharge, while the magnetic field strength | B | and degree of balancing are varied. A significant deposition of the film forming material perpendicular to the target surface is observed for both sputter techniques. This sideways deposition decreases with increasing axial distance from the target surface. The sideways deposition rate is always the highest in dc operation, while it is lower for HiPIMS operation. The magnetic field strength has a strong influence on the sideways deposition rate in HiPIMS but not in dcMS. Furthermore, in HiPIMS operation, the radial ion deposition rate is always at least as large as the axial ion deposition rate and often around two times higher. Thus, there are a significantly higher number of ions traveling radially in the HiPIMS discharge. A comparison of the total radial as well as axial fluxes across the entire investigated plasma volume between the target and the substrate position allows for revised estimates of radial over axial flux fractions for different magnetic field configurations. It is here found that the relative radial flux of the film forming material is greater in dcMS compared to HiPIMS for almost all cases investigated. It is therefore concluded that the commonly reported reduction of the (axial) deposition rate in HiPIMS compared to dcMS does not seem to be linked with an increase in sideways material transport in HiPIMS.

Subject headings and genre

Added entries (persons, corporate bodies, meetings, titles ...)

  • Cada, MartinAcad Sci Czech Republ, Inst Phys, Vvi, Na Slovance 2, Prague 18221 8, Czech Republic. (author)
  • Hubicka, ZdenekAcad Sci Czech Republ, Inst Phys, Vvi, Na Slovance 2, Prague 18221 8, Czech Republic. (author)
  • Unaldi, SelenUniv Paris Saclay, Univ Paris Sud, CNRS, UMR 8578,LPGP, F-91405 Orsay, France. (author)
  • Raadu, Michael A.KTH,Rymd- och plasmafysik,KTH Royal Inst Technol, Sweden(Swepub:kth)u1ajzw7w (author)
  • Brenning, NilsLinköpings universitet,KTH,Rymd- och plasmafysik,Linköping Univ, Plasma & Coatings Phys Div, IFM Mat Phys, SE-58183 Linköping, Sweden.,Plasma och ytbeläggningsfysik,Tekniska fakulteten,KTH Royal Inst Technol, Sweden(Swepub:liu)nilbr83 (author)
  • Gudmundsson, Jon Tomas,1965-KTH,Rymd- och plasmafysik,Univ Iceland, Sci Inst, IS-107 Reykjavik, Iceland.,Univ Iceland, Iceland; KTH Royal Inst Technol, Sweden(Swepub:kth)u1q27a34 (author)
  • Lundin, DanielLinköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten,Univ Paris Saclay, France(Swepub:liu)danlu03 (author)
  • Univ Iceland, Sci Inst, IS-107 Reykjavik, Iceland.;Univ Paris Saclay, Univ Paris Sud, CNRS, UMR 8578,LPGP, F-91405 Orsay, France.Acad Sci Czech Republ, Inst Phys, Vvi, Na Slovance 2, Prague 18221 8, Czech Republic. (creator_code:org_t)

Related titles

  • In:Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films: American Vacuum Society38:30734-21011520-8559

Internet link

Find in a library

To the university's database

Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.

 
pil uppåt Close

Copy and save the link in order to return to this view