In Situ Patterning of Ultrasharp Dopant Profiles in Silicon

Cooil, Simon P.Norwegian University of Science and Technology,Aberystwyth University (författare)

We develop a method for patterning a buried two-dimensional electron gas (2DEG) in silicon using low kinetic energy electron stimulated desorption (LEESD) of a monohydride resist mask. A buried 2DEG forms as a result of placing a dense and narrow profile of phosphorus dopants beneath the silicon surface; a so-called δ -layer. Such 2D dopant profiles have previously been studied theoretically, and by angle-resolved photoemission spectroscopy, and have been shown to host a 2DEG with properties desirable for atomic-scale devices and quantum computation applications. Here we outline a patterning method based on low kinetic energy electron beam lithography, combined with in situ characterization, and demonstrate the formation of patterned features with dopant concentrations sufficient to create localized 2DEG states.

Mazzola, FedericoNorwegian University of Science and Technology,University of St Andrews (författare)
Klemm, Hagen W.Fritz Haber Institute of the Max Planck Society (författare)
Peschel, GinaFritz Haber Institute of the Max Planck Society (författare)
Niu, Yuran R.Lund University,Lunds universitet,MAX IV-laboratoriet,MAX IV Laboratory(Swepub:lu)maxl-yun (författare)
Zakharov, Alexei A.Lund University,Lunds universitet,MAX IV-laboratoriet,MAX IV Laboratory(Swepub:lu)maxl-aza (författare)
Simmons, Michelle Y.University of New South Wales (författare)
Schmidt, ThomasFritz Haber Institute of the Max Planck Society (författare)
Evans, D. AndrewAberystwyth University (författare)
Miwa, Jill A.Aarhus University (författare)
Wells, Justin W.Norwegian University of Science and Technology(Swepub:lu)maxl-jnw (författare)
Norwegian University of Science and TechnologyAberystwyth University (creator_code:org_t)

Ingår i:ACS Nano: American Chemical Society (ACS)11:2, s. 1683-16881936-08511936-086X

Av författaren/redakt...: Cooil, Simon P.; Mazzola, Federic ...; Klemm, Hagen W.; Peschel, Gina; Niu, Yuran R.; Zakharov, Alexei ...; visa fler...; Simmons, Michell ...; Schmidt, Thomas; Evans, D. Andrew; Miwa, Jill A.; Wells, Justin W.; visa färre...

Om ämnet

Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.