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  • Chaudhary, ShilpiLund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH,Punjab Engineering College University of Technology (author)

Adsorption of 3-(triethoxysilyl)propionitrile on a rutile TiO2(110) surface : An X-ray photoelectron spectroscopy study

  • Article/chapterEnglish2020

Publisher, publication year, extent ...

  • AIP Publishing,2020

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  • LIBRIS-ID:oai:lup.lub.lu.se:e97c4cf7-71eb-422d-bbd9-6b78bd04615f
  • https://lup.lub.lu.se/record/e97c4cf7-71eb-422d-bbd9-6b78bd04615fURI
  • https://doi.org/10.1063/5.0017313DOI

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  • Language:English
  • Summary in:English

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  • Subject category:kon swepub-publicationtype
  • Subject category:ref swepub-contenttype

Notes

  • The adsorption of 3-(triethoxysilyl)propionitrile (TESP) on a reduced rutile TiO2(110) surface has been investigated using synchrotron-based X-ray photoelectron spectroscopy in ultrahigh vacuum (UHV). We have studied TESP adsorption on two surface preparation of rutile TiO2 (110) to explore the role of surface defects. In the first preparation, the adsorption of TESP was studied on reduced TiO2 (110) surface at room temperature. In the second experiment TESP was adsorbed on the oxygen-treated TiO2 surface to quench the oxygen vacancies generated by UHVannealing of the TiO2 crystal. The molecular footprints of the TESP molecules confirms the adsorption on both types of TiO2(110) surfaces. In the case of the reduced surface, temperature-dependent XPS measurements show the thermal stability of TESP molecules up to 600 °C. The comparison of the nitrogen and carbon lineshapes for both preparations suggests different adsorption geometries on the reduced and oxygen-dosed surfaces. To the best of our knowledge, the UHV preparations and measurements of TESP adsorption on rutile TiO2 (110) in the present study are reported for the first time.

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  • Head, Ashley R.Lund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH(Swepub:lu)slju-alh (author)
  • Johansson, NiclasLund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH(Swepub:lu)slju-naj (author)
  • Snezhkova, OlesiaLund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH(Swepub:lu)slju-osn (author)
  • Ye, LeiLund University,Lunds universitet,Tillämpad biokemi,Centrum för tillämpade biovetenskaper,Kemiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Pure and Applied Biochemistry,Center for Applied Life Sciences,Department of Chemistry,Departments at LTH,Faculty of Engineering, LTH(Swepub:lu)tbk-lye (author)
  • Montelius, LarsLund University,Lunds universitet,NanoLund: Centre for Nanoscience,Annan verksamhet, LTH,Lunds Tekniska Högskola,Fasta tillståndets fysik,Fysiska institutionen,Institutioner vid LTH,Other operations, LTH,Faculty of Engineering, LTH,Solid State Physics,Department of Physics,Departments at LTH,Faculty of Engineering, LTH(Swepub:lu)ftf-lmo (author)
  • Schnadt, JoachimLund University,Lunds universitet,NanoLund: Centre for Nanoscience,Annan verksamhet, LTH,Lunds Tekniska Högskola,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Other operations, LTH,Faculty of Engineering, LTH,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH(Swepub:lu)slju-jst (author)
  • Sharma, Veerendra K. (editor)
  • Prajapat, C. L. (editor)
  • Yusuf, S. M. (editor)
  • SynkrotronljusfysikFysiska institutionen (creator_code:org_t)

Related titles

  • In:DAE Solid State Physics Symposium 2019: AIP Publishing22651551-76160094-243X9780735420250

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