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Charging phenomena at the interface between high-k dielectrics and SiOx interlayers
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- Engström, Olof, 1943 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Raeissi, Bahman, 1979 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Piscator, Johan, 1977 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Mitrovic, I. Z. (author)
- Hall, S. (author)
- Gottlob, H. D. B. (author)
- Schmidt, M. (author)
- Hurley, P.K. (author)
- Cherkaoui, K. (author)
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- (creator_code:org_t)
- 2009
- 2009
- English.
- In: 8th Symposium Diagnostics & Yield Advanced Silicon Devices and Technologies for the ULSI Era, Warsaw, June 22 - 24, 2009 (Invited).
- Conference paper (peer-reviewed)
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- TEKNIK OCH TEKNOLOGIER -- Annan teknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Other Engineering and Technologies (hsv//eng)
- TEKNIK OCH TEKNOLOGIER -- Annan teknik -- Övrig annan teknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Other Engineering and Technologies -- Other Engineering and Technologies not elsewhere specified (hsv//eng)
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