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Does carrier veloci...
Does carrier velocity saturation help to enhance fmax in graphene field-effect transistors?
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- Feijoo, Pedro C. (författare)
- Universitat Autonoma de Barcelona (UAB)
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- Pasadas, Francisco (författare)
- Universitat Autonoma de Barcelona (UAB)
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- Bonmann, Marlene, 1988 (författare)
- Chalmers tekniska högskola,Chalmers University of Technology
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visa fler...
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- Asad, Muhammad, 1986 (författare)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Yang, Xinxin, 1988 (författare)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Generalov, Andrey, 1987 (författare)
- Aalto-Yliopisto,Aalto University
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- Vorobiev, Andrei, 1963 (författare)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Banszerus, Luca (författare)
- Rheinisch-Westfaelische Technische Hochschule Aachen,RWTH Aachen University
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- Stampfer, Christoph (författare)
- Rheinisch-Westfaelische Technische Hochschule Aachen,RWTH Aachen University
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Otto, Martin (författare)
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Neumaier, Daniel (författare)
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- Stake, Jan, 1971 (författare)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Jiménez, David (författare)
- Universitat Autonoma de Barcelona (UAB)
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(creator_code:org_t)
- 2020
- 2020
- Engelska.
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Ingår i: Nanoscale Advances. - : Royal Society of Chemistry (RSC). - 2516-0230. ; 2:9, s. 4179-4186
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https://pubs.rsc.org...
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https://research.cha...
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https://doi.org/10.1...
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Abstract
Ämnesord
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- It has been argued that current saturation in graphene field-effect transistors (GFETs) is needed to get optimal maximum oscillation frequency (f(max)). This paper investigates whether velocity saturation can help to get better current saturation and if that correlates with enhancedf(max). We have fabricated 500 nm GFETs with high extrinsicf(max)(37 GHz), and later simulated with a drift-diffusion model augmented with the relevant factors that influence carrier velocity, namely: short-channel electrostatics, saturation velocity effect, graphene/dielectric interface traps, and self-heating effects. Crucially, the model provides microscopic details of channel parameters such as carrier concentration, drift and saturation velocities, allowing us to correlate the observed macroscopic behavior with the local magnitudes. When biasing the GFET so all carriers in the channel are of the same sign resulting in highly concentrated unipolar channel, we find that the larger the drain bias is, both closer the carrier velocity to its saturation value and the higher thef(max)are. However, the highestf(max)can be achieved at biases where there exists a depletion of carriers near source or drain. In such a situation, the highestf(max)is not found in the velocity saturation regime, but where carrier velocity is far below its saturated value and the contribution of the diffusion mechanism to the current is comparable to the drift mechanism. The position and magnitude of the highestf(max)depend on the carrier concentration and total velocity, which are interdependent and are also affected by the self-heating. Importantly, this effect was found to severely limit radio-frequency performance, reducing the highestf(max)from similar to 60 to similar to 40 GHz.
Ämnesord
- TEKNIK OCH TEKNOLOGIER -- Nanoteknik -- Nanoteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Nano-technology -- Nano-technology (hsv//eng)
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik -- Annan elektroteknik och elektronik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering -- Other Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
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Feijoo, Pedro C.
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Pasadas, Francis ...
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Bonmann, Marlene ...
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Asad, Muhammad, ...
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Yang, Xinxin, 19 ...
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Generalov, Andre ...
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visa fler...
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Vorobiev, Andrei ...
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Banszerus, Luca
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Stampfer, Christ ...
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Otto, Martin
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Neumaier, Daniel
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Stake, Jan, 1971
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Jiménez, David
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visa färre...
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- TEKNIK OCH TEKNOLOGIER
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TEKNIK OCH TEKNO ...
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och Nanoteknik
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och Nanoteknik
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- TEKNIK OCH TEKNOLOGIER
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TEKNIK OCH TEKNO ...
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och Elektroteknik oc ...
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och Annan elektrotek ...
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Nanoscale Advanc ...
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Chalmers tekniska högskola