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- Liu, Yueqiang,1971Chalmers tekniska högskola,Chalmers University of Technology (author)
Comparative investigation of ELM control based on toroidal modelling of plasma response to RMP fields
- Article/chapterEnglish2017
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- AIP Publishing,2017
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- LIBRIS-ID:oai:research.chalmers.se:16a12781-b51e-404d-9e73-9f6ca7788f44
- https://doi.org/10.1063/1.4978884DOI
- https://research.chalmers.se/publication/250761URI
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- Language:English
- Summary in:English
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- Extensive modelling efforts of the plasma response to the resonant magnetic perturbation fields, utilized for controlling the edge localized mode (ELM), help to identify the edge-peeling response as a key factor, which correlates to the observed ELM mitigation in several tokamak devices, including MAST, ASDEX Upgrade, EAST, and HL-2A. The recently observed edge safety factor window for ELM mitigation in HL-2A experiments is explained in terms of the edge-peeling response. The computed plasma response, based on toroidal single fluid resistive plasma model with different assumption of toroidal flows, is found generally larger in ELM suppressed cases as compared to that of the ELM mitigated cases, in ASDEX Upgrade and DIII-D. The plasma shaping, in particular, the plasma triangularity, contributes to the enhanced plasma response. But the shaping does not appear to be the sole factor-other factors such as the (higher) pedestal pressure and/or current can also lead to increased edge-peeling response.
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- Kirk, A.Culham Science Centre (author)
- Li, L.Donghua University (author)
- In, Y. (author)
- Nazikian, R.Princeton University (author)
- Sun, Y. W.Chinese Academy of Sciences (author)
- Suttrop, W.Max-Planck-Institutet för plasma-fysik,Max-Planck-Institute for Plasma Physics (author)
- Lyons, B.General Atomics (author)
- Ryan, D.Culham Science Centre (author)
- Wang, S.Southwestern Institute of Physics China (author)
- Yang, X.Dalian University of Technology (author)
- Zhou, L. N.Dalian University of Technology (author)
- Chalmers tekniska högskolaCulham Science Centre (creator_code:org_t)
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- In:Physics of Plasmas: AIP Publishing24:51089-76741070-664X
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