id:"swepub:oai:research.chalmers.se:1974a4ce-212b-4504-8b24-7ab69d791764"
Search: id:"swepub:oai:research.chalmers.se:1974a4ce-212b-4504-8b24-7ab69d791764" > ZrO2 and ZrO2/Y2O3 ...
- 1 of 1
- Previous record
- Next record
- To hitlist
- Johansson, MikaelChalmers tekniska högskola,Chalmers University of Technology (author)
ZrO2 and ZrO2/Y2O3 gate dielectrics prepared by evaporation and annealing processes
- Article/chapterEnglish2002
Publisher, publication year, extent ...
- 2002
Numbers
- LIBRIS-ID:oai:research.chalmers.se:1974a4ce-212b-4504-8b24-7ab69d791764
- https://research.chalmers.se/publication/17786URI
- https://doi.org/10.1109/ASDAM.2002.1088524DOI
Supplementary language notes
- Language:English
- Summary in:English
Part of subdatabase
- SwePubSwePub
Classification
Notes
- The electrical characteristics of MOS capacitors with ZrO2 gate dielectric prepared by e-beam evaporation of Zr or Yttrium Stabilized Zirconia (YSZ) and subsequent thermal treatment are reported. With this method dielectrics corresponding to an equivalent oxide thickness (EOT) of 1.9 nm and a relative dielectric constant of approximately 15 have been prepared. The effect of annealing on Zr incorporation into the Si substrate is investigated SIMS analysis showed no signs of Zr diffusion in the substrate at temperatures as high as 900°C and that significant diffusion from the dielectric layer occur only at 1100°C
Subject headings and genre
- TEKNIK OCH TEKNOLOGIER Elektroteknik och elektronik Annan elektroteknik och elektronik hsv//swe
- ENGINEERING AND TECHNOLOGY Electrical Engineering, Electronic Engineering, Information Engineering Other Electrical Engineering, Electronic Engineering, Information Engineering hsv//eng
- mass spectroscopic chemical analysis
- secondary ion mass spectra
- electron beam deposition
- yttrium compounds
- MOS capacitors
- zirconium compounds
- annealing
- permittivity
- diffusion
Added entries (persons, corporate bodies, meetings, titles ...)
- Yousif, M. Y. A.,1963Chalmers tekniska högskola,Chalmers University of Technology (author)
- Sareen, Alok,1972Chalmers tekniska högskola,Chalmers University of Technology (author)
- Lundgren, Per,1968Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)boris (author)
- Bengtsson, Stefan,1961Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)stefanb (author)
- Södervall, Ulf,1954Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)f8bus (author)
- Chalmers tekniska högskola (creator_code:org_t)
Related titles
- In:ASDAM '02. Conference Proceedings. Fourth International Conference on Advanced Semiconductor Devices and Microsystems, s. 279-
Internet link
To the university's database
- 1 of 1
- Previous record
- Next record
- To hitlist
Find more in SwePub
- By the author/editor
- Johansson, Mikae ...
- Yousif, M. Y. A. ...
- Sareen, Alok, 19 ...
- Lundgren, Per, 1 ...
- Bengtsson, Stefa ...
- Södervall, Ulf, ...
- About the subject
-
- ENGINEERING AND TECHNOLOGY
- ENGINEERING AND ...
- and Electrical Engin ...
- and Other Electrical ...
- Articles in the publication
- ASDAM '02. Confe ...
- By the university
- Chalmers University of Technology
Search outside SwePub
- Extend your search to:
- Google Book Search
- Google Scholar
Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.
- Copyright © LIBRIS - National Library Systems
- LIBRIS.kb.se
