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Practical and Fundamental Impact of Epitaxial Graphene on Quantum Metrology

Janssen, Tjbm (author)
National Physical Laboratory (NPL)
Tzalenchuk, A.Y. (author)
National Physical Laboratory (NPL),Royal Holloway University of London
Lara Avila, Samuel, 1983 (author)
Chalmers tekniska högskola,Chalmers University of Technology
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Kubatkin, Sergey, 1959 (author)
Chalmers tekniska högskola,Chalmers University of Technology
Fal'ko, V. (author)
Lancaster University
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 (creator_code:org_t)
2013-10-13
2013
English.
In: Mapan - Journal of Metrology Society of India. - : Springer Science and Business Media LLC. - 0970-3950 .- 0974-9853. ; 28:4, s. 239-250
  • Research review (peer-reviewed)
Abstract Subject headings
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  • The discovery 8 years ago of the quantum Hall effect (QHE) in graphene sparked an immediate interest in the metrological community. Here was a material which was completely different from commonly used semiconductor systems and which seemed to have some uniques properties which could make it ideally suited for high-precision resistance metrology. However, measuring the QHE in graphene turned out to be not so simple as first thought. In particular the small size of exfoliated graphene samples made precision measurements difficult. This dramatically changed with the development of large-area graphene grown on SiC and in this short review paper we discuss the journey from first observation to the highest-ever precision comparison of the QHE.

Subject headings

NATURVETENSKAP  -- Fysik (hsv//swe)
NATURAL SCIENCES  -- Physical Sciences (hsv//eng)

Keyword

SI
QUANTIZED HALL RESISTANCE
quantum Hall effect
Epitaxial graphene
Metrology
CAPACITANCE
Graphene
GAS
GALLIUM-ARSENIDE
STANDARD

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