Microstructural Investigation of the Initial Oxidation of the FeCrAlRE Alloy Kanthal AF in Dry and Wet O-2 at 600 and 800 degrees C

Canovic, Sead,1979Chalmers tekniska högskola,Chalmers University of Technology (författare)

The FeCrAlRE (where RE is reactive element) alloy Kanthal AF was exposed isothermally at 600 and 800 degrees C for 72 h in dry O-2 and in O-2 with 10 vol % H2O. The mass gains were 3-5 times higher at the higher temperature. The presence of water vapor increased the oxidation rate at 800 degrees C, while no significant effect was observed at 600 degrees C. A thin two-layered oxide formed at 600 degrees C: an outer (Fe, Cr)(2)O-3 corundum-type oxide, containing some Al, and an inner, probably amorphous, Al-rich oxide. At 800 degrees C a two-layered oxide formed in both environments. The inner layer consisted of inward grown alpha-Al2O3. In dry O-2 the originally formed outward grown gamma-Al2O3 had transformed to alpha-Al2O3 after 72 h. Water vapor stabilized the outward grown gamma-Al2O3 and hence no transformation occurred after 72 h in humid environment. RE-rich oxide particles with varying composition (Y, Zr, and Ti) were distributed in the base oxide at both temperatures and in both environments. The RE-rich particles were separated from the alloy substrate by a layer of Al-rich oxide. At 800 degrees C the Y-rich RE particles were surrounded by thick oxide patches in both dry and humid O-2.

Engkvist, Josefin,1972Högskolan i Dalarna,Dalarna university(Swepub:cth)josengk (författare)
Liu, Fang,1975Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)fangliu (författare)
Lai, Haiping,1979Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)haiping (författare)
Götlind, Helena,1978Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)helenaj (författare)
Hellström, Kristina M,1971Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)krh (författare)
Svensson, Jan-Erik,1965Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)jes (författare)
Johansson, Lars-Gunnar,1952Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)lg (författare)
Olsson, M.Högskolan i Dalarna,Dalarna university (författare)
Halvarsson, Mats,1965Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)f10mh (författare)
Chalmers tekniska högskolaHögskolan i Dalarna (creator_code:org_t)

Ingår i:Journal of the Electrochemical Society: The Electrochemical Society157:6, s. C223-C2301945-71110013-4651

Av författaren/redakt...: Canovic, Sead, 1 ...; Engkvist, Josefi ...; Liu, Fang, 1975; Lai, Haiping, 19 ...; Götlind, Helena, ...; Hellström, Krist ...; visa fler...; Svensson, Jan-Er ...; Johansson, Lars- ...; Olsson, M.; Halvarsson, Mats ...; visa färre...

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