Search: L773:1938 6737 OR L773:1938 5862 OR L773:9781607685395 >
Properties of Metal...
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Engström, Olof,1943Chalmers tekniska högskola,Chalmers University of Technology
(author)
Properties of Metal/High-k Oxide/Graphene Structures
- Article/chapterEnglish2017
Publisher, publication year, extent ...
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2017-09-22
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The Electrochemical Society,2017
Numbers
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LIBRIS-ID:oai:research.chalmers.se:f8b59957-7d35-45a7-bee6-59d3d0d4e7f5
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https://research.chalmers.se/publication/501345URI
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https://doi.org/10.1149/08001.0157ecstDOI
Supplementary language notes
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Language:English
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Summary in:English
Part of subdatabase
Classification
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Subject category:kon swepub-publicationtype
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Subject category:ref swepub-contenttype
Notes
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The challenge of interpreting experimental data from capacitance versus voltage (C-V) measurements on metal/high-k oxide/graphene (MOG) structures is discussed. Theoretical expressions for the influence of interface states, bulk oxide traps, measurement frequency, temperature and puddles are derived and compared with experiments. The nature of oxide traps and their impact on C-V data is treated especially from the view of electron-lattice interaction at electron emission and capture and possible performance as border traps, resembling interface states. We find that characterization on detailed physical origins leading to effects on C-V data is a more complicated issue than the corresponding analysis of metal/oxide/semiconductor (MOS) structures.
Subject headings and genre
Added entries (persons, corporate bodies, meetings, titles ...)
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Lemme, M. C.Rheinisch-Westfaelische Technische Hochschule Aachen,RWTH Aachen University,Universität Siegen,University of Siegen,Gesellschaft fur Angewandte Mikro- und Optoelektronik mit Beschrankterhaftung GmbH (AMO),AMO GmbH
(author)
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Habibpour, Omid,1979Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)habibpou
(author)
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Chalmers tekniska högskolaRheinisch-Westfaelische Technische Hochschule Aachen
(creator_code:org_t)
Related titles
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In:ECS Transactions: The Electrochemical Society80:1, s. 157-1761938-58621938-6737
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