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Sökning: WFRF:(Östling Mikael) > (2015-2019) > Integration and Hig...

LIBRIS Formathandbok  (Information om MARC21)
FältnamnIndikatorerMetadata
00003175naa a2200421 4500
001oai:DiVA.org:kth-210461
003SwePub
008170706s2017 | |||||||||||000 ||eng|
024a https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-2104612 URI
024a https://doi.org/10.1007/s11664-017-5447-32 DOI
040 a (SwePub)kth
041 a engb eng
042 9 SwePub
072 7a ref2 swepub-contenttype
072 7a art2 swepub-publicationtype
100a Ekström, Mattiasu KTH,Elektronik4 aut0 (Swepub:kth)u1l6zf9x
2451 0a Integration and High-Temperature Characterization of Ferroelectric Vanadium-Doped Bismuth Titanate Thin Films on Silicon Carbide
264 c 2017-03-20
264 1b SPRINGER,c 2017
338 a print2 rdacarrier
500 a QC 20170706
520 a 4H-SiC electronics can operate at high temperature (HT), e.g., 300A degrees C to 500A degrees C, for extended times. Systems using sensors and amplifiers that operate at HT would benefit from microcontrollers which can also operate at HT. Microcontrollers require nonvolatile memory (NVM) for computer programs. In this work, we demonstrate the possibility of integrating ferroelectric vanadium-doped bismuth titanate (BiTV) thin films on 4H-SiC for HT memory applications, with BiTV ferroelectric capacitors providing memory functionality. Film deposition was achieved by laser ablation on Pt (111)/TiO2/4H-SiC substrates, with magnetron-sputtered Pt used as bottom electrode and thermally evaporated Au as upper contacts. Film characterization by x-ray diffraction analysis revealed predominately (117) orientation. P-E hysteresis loops measured at room temperature showed maximum 2P (r) of 48 mu C/cm(2), large enough for wide read margins. P-E loops were measurable up to 450A degrees C, with losses limiting measurements above 450A degrees C. The phase-transition temperature was determined to be about 660A degrees C from the discontinuity in dielectric permittivity, close to what is achieved for ceramics. These BiTV ferroelectric capacitors demonstrate potential for use in HT NVM applications for SiC digital electronics.
650 7a TEKNIK OCH TEKNOLOGIERx Elektroteknik och elektronik0 (SwePub)2022 hsv//swe
650 7a ENGINEERING AND TECHNOLOGYx Electrical Engineering, Electronic Engineering, Information Engineering0 (SwePub)2022 hsv//eng
653 a Ferroelectric
653 a high temperature (HT)
653 a memory device
653 a silicon carbide (4H-SiC)
653 a thin film
653 a vanadium-doped bismuth titanate (BiTV)
700a Khartsev, Sergiyu KTH,Elektronik4 aut0 (Swepub:kth)u1barex4
700a Östling, Mikaelu KTH,Elektronik4 aut0 (Swepub:kth)u1u0kle4
700a Zetterling, Carl-Mikael,d 1966-u KTH,Elektronik4 aut0 (Swepub:kth)u15o61ns
710a KTHb Elektronik4 org
773t Journal of Electronic Materialsd : SPRINGERg 46:7, s. 4478-4484q 46:7<4478-4484x 0361-5235x 1543-186X
856u https://doi.org/10.1007/s11664-017-5447-3y Fulltext
8564 8u https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-210461
8564 8u https://doi.org/10.1007/s11664-017-5447-3

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