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Surface studies of hydrogen etched 3C-SiC(001) on Si(001)

Coletti, C. (author)
University of South Florida, Tampa, USA
Frewin, C. L. (author)
University of South Florida, Tampa, USA
Saddow, S. E. (author)
University of South Florida, Tampa, USA
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Hetzel, M. (author)
Max-Planck-Institut für Festkörperforschung, Stuttgart, Germany
Virojanadara, Chariya (author)
Max-Planck-Institut für Festkörperforschung, Stuttgart, Germany
Starke, Ulrich (author)
Max-Planck-Institut für Festkörperforschung, Stuttgart, Germany
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 (creator_code:org_t)
American Institute of Physics (AIP), 2007
2007
English.
In: Applied Physics Letters. - : American Institute of Physics (AIP). - 0003-6951 .- 1077-3118. ; 91:6, s. 061914-
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • Themorphology and structure of 3C-SiC(001) surfaces, grown on Si(001) andprepared via hydrogen etching, are studied using atomic force microscopy(AFM), low-energy electron diffraction (LEED), and Auger electron spectroscopy (AES).On the etched samples, flat surfaces with large terraces andatomic steps are revealed by AFM. In ultrahigh vacuum asharp LEED pattern with an approximate (5×1) periodicity is observed. AES studies reveal a “bulklike” composition up to the nearsurface region and indicate that an overlayer consisting of aweakly bound silicon oxide monolayer is present.

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