Operating modes and target erosion in high power impulse magnetron sputtering

Rudolph, M. (author): Leibniz Inst Surface Engn IOM, Permoserstr 15, D-04318 Leipzig, Germany.

Brenning, Nils (author): Linköpings universitet,KTH,Rymd- och plasmafysik,Linköping Univ, Plasma & Coatings Phys Div, IFM Mat Phys, SE-58183 Linköping, Sweden.,Plasma och ytbeläggningsfysik,Tekniska fakulteten,KTH Royal Inst Technol, Sweden

Hajihoseini, H. (author): Univ Twente, MESA Inst Nanotechnol, Ind Focus Grp XUV Opt, Drienerlolaan 5, NL-7522 NB Enschede, Netherlands.

Raadu, Michael A. (author): KTH,Rymd- och plasmafysik,KTH Royal Inst Technol, Sweden

Fischer, Joel (author): Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten

Gudmundsson, Jon Tomas, 1965- (author): KTH,Rymd- och plasmafysik,Univ Iceland, Sci Inst, Dunhaga 3, IS-107 Reykjavik, Iceland.,KTH Royal Inst Technol, Sweden; Univ Iceland, Iceland

Lundin, Daniel (author): Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten

Leibniz Inst Surface Engn IOM, Permoserstr 15, D-04318 Leipzig, Germany Rymd- och plasmafysik (creator_code:org_t)

American Vacuum Society, 2022
2022
English.
In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. - : American Vacuum Society. - 0734-2101 .- 1520-8559. ; 40:4, s. 043005-

Related links:: https://liu.diva-por... (primary) (Raw object); show more...; https://urn.kb.se/re...; https://doi.org/10.1...; https://urn.kb.se/re...; show less...

Abstract Subject headings

Magnetron sputtering combines a glow discharge with sputtering from a target that simultaneously serves as a cathode for the discharge. The electrons of the discharge are confined between overarching magnetic field lines and the negatively biased cathode. As the target erodes during the sputter process, the magnetic field strengthens in the cathode vicinity, which can influence discharge parameters with the risk of impairing reproducibility of the deposition process over time. This is of particular concern for high-power impulse magnetron sputtering (HiPIMS) as the discharge current and voltage waveforms vary strongly with the magnetic field strength. We here discuss ways to limit the detrimental effect of target erosion on the film deposition process by choosing an appropriate mode of operation for the discharge. The goal is to limit variations of two principal flux parameters, the deposition rate and the ionized flux fraction. As an outcome of the discussion, we recommend operating HiPIMS discharges by maintaining the peak discharge current constant.

By the author/editor: Rudolph, M.; Brenning, Nils; Hajihoseini, H.; Raadu, Michael A ...; Fischer, Joel; Gudmundsson, Jon ...; show more...; Lundin, Daniel; show less...

About the subject

NATURAL SCIENCES: NATURAL SCIENCES; and Physical Science ...; and Fusion Plasma an ...

NATURAL SCIENCES: NATURAL SCIENCES; and Physical Science ...; and Condensed Matter ...

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