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Energy distribution...
Energy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar/O2 mixtures
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- Andersson, Jon M. (författare)
- Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska högskolan
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- Wallin, Erik (författare)
- Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska högskolan
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- Münger, Peter (författare)
- Linköpings universitet,Teoretisk Fysik,Tekniska högskolan
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- Helmersson, Ulf (författare)
- Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska högskolan
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(creator_code:org_t)
- College Park, MD, United States : American Institute of Physics (AIP), 2006
- 2006
- Engelska.
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Ingår i: Journal of Applied Physics. - College Park, MD, United States : American Institute of Physics (AIP). - 0021-8979 .- 1089-7550. ; 100:3, s. Art. No. 033305 AUG 1 2006-
- Relaterad länk:
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https://liu.diva-por... (primary) (Raw object)
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- The ion flux obtained during reactive magnetron sputtering of an Al target in Ar/O2 gas mixtures was studied by energy-resolved mass spectrometry, as a function of the total and O2 partial pressures. The positive ions of film-forming species exhibited bimodal energy distributions, both for direct current and radio frequency discharges, with the higher energy ions most likely originating from sputtered neutrals. For the negative oxygen ions a high-energy peak was observed, corresponding to ions formed at the target surface and accelerated towards the substrate over the sheath potential. As the total pressure was increased the high-energy peaks diminished due to gas-phase scattering. Based on these results, the role of energetic bombardment for the phase constituent of alumina thin films are discussed.
Nyckelord
- aluminium
- sputter deposition
- diffusion
- mass spectra
- high-frequency discharges
- plasma materials processing
- NATURAL SCIENCES
- NATURVETENSKAP
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
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