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Non-conventional Cu thin films deposited on Y substrate by sputtering

Perrone, Alessio (author)
University of Salento, Italy
D'Elia, M (author)
University of Salento, Italy
Di Giulio, M. (author)
University of Salento, Italy
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Maruccio, G. (author)
University of Salento, Italy
Cola, A. (author)
National Council Research, Institute for Microelectronics & Microsystems, Italy
Stankova, N. (author)
Institute of Electronics, Bulgarian Academy of Sciences, Bulgaria
Kovacheva, D. (author)
Institute of Electronics, Bulgarian Academy of Sciences, Bulgaria
Broitman, Esteban, 1958- (author)
Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan,Tunnfilmsfysik, Thin Film Physics
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 (creator_code:org_t)
Elsevier, 2014
2014
English.
In: Nuclear Instruments and Methods in Physics Research Section A. - : Elsevier. - 0168-9002 .- 1872-9576. ; 752, s. 27-32
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • Copper (Cu) thin films were deposited on yttrium (Y) substrate by sputtering. During the deposition, a small central area of the Y substrate was shielded to avoid the film deposition and was successively used to study its photoemissive properties. This configuration has two advantages: the cathode presents (i) the quantum efficiency and the work function of Y and (ii) high electrical compatibility when inserted into the conventional radio-frequency gun built with Cu bulk. The photocathode was investigated by scanning electron microscopy to determine surface morphology. X-ray diffraction and atomic force microscopy studies were performed to compare the structure and surface properties of the deposited film. The measured electrical resistivity value of the Cu film was similar to that of high purity Cu bulk. Film to substrate adhesion was also evaluated using the Daimler–Benz Rockwell-C adhesion test method. Finally, the photoelectron performance in terms of quantum efficiency was obtained in a high vacuum photodiode cell before and after laser cleaning procedures. A comparison with the results obtained with a twin sample prepared by pulsed laser deposition is presented and discussed.

Keyword

photocathodes
Cu thin films
magnetron sputtering

Publication and Content Type

ref (subject category)
art (subject category)

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