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Gas phase chemical ...
Gas phase chemical vapor deposition chemistry of triethylboron probed by boron-carbon thin film deposition and quantum chemical calculations
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- Imam, Mewlude (author)
- Linköpings universitet,Tekniska fakulteten,Tunnfilmsfysik,European Spallat Source ESS AB, Sweden
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- Gaul, Konstantin (author)
- University of Marburg, Germany; University of Marburg, Germany
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- Stegmueller, Andreas (author)
- University of Marburg, Germany; University of Marburg, Germany
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- Höglund, Carina (author)
- Linköping University,Lund University,Lunds universitet,Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,European Spallat Source ESS AB, Sweden,European Spallation Source ESS AB,Stiftelser och övriga anknutna verksamheter,Other Institutions and Utilities
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- Jensen, Jens (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Hultman, Lars (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Birch, Jens (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Tonner, Ralf (author)
- University of Marburg, Germany; University of Marburg, Germany
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- Pedersen, Henrik (author)
- Linköpings universitet,Kemi,Tekniska fakulteten
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(creator_code:org_t)
- 2015
- 2015
- English.
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In: Journal of Materials Chemistry C. - : ROYAL SOC CHEMISTRY. - 2050-7526 .- 2050-7534. ; 3:41, s. 10898-10906
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Abstract
Subject headings
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- We present triethylboron (TEB) as a single-source precursor for chemical vapor deposition (CVD) of BxC thin films and study its gas phase chemistry under CVD conditions by quantum chemical calculations. A comprehensive thermochemical catalogue for the species of the gas phase chemistry of TEB is examined and found to be dominated by beta-hydride eliminations of C2H4 to yield BH3. A complementary bimolecular reaction path based on H-2 assisted C2H6 elimination to BH3 is also significant at lower temperatures in the presence of hydrogen. Furthermore, we find a temperature window of 600-1000 degrees C for the deposition of X-ray amorphous BxC films with 2.5 less than= x less than= 4.5 from TEB. Films grown at temperatures below 600 degrees C contain high amounts of H, while temperatures above 1000 degrees C result in C-rich films. The film density and hardness are determined to be in the range of 2.40-2.65 g cm(-3) and 29-39 GPa, respectively, within the determined temperature window.
Subject headings
- NATURVETENSKAP -- Fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences (hsv//eng)
- NATURVETENSKAP -- Kemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences (hsv//eng)
- NATURVETENSKAP -- Kemi -- Materialkemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Materials Chemistry (hsv//eng)
Publication and Content Type
- ref (subject category)
- art (subject category)
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