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Structural and mech...
Structural and mechanical properties of amorphous AlMgB14 thin films deposited by DC magnetron sputtering on Si, Al2O3 and MgO substrates
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- Noroozi, Mohammad (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,Finisar Sweden AB, Sweden
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- Petruhins, Andrejs (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Greczynski, Grzegorz (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Rosén, Johanna (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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- Eklund, Per (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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(creator_code:org_t)
- 2020-01-28
- 2020
- Engelska.
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Ingår i: Applied Physics A. - : SPRINGER HEIDELBERG. - 0947-8396 .- 1432-0630. ; 126:2
- Relaterad länk:
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https://liu.diva-por... (primary) (Raw object)
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https://link.springe...
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- AlMgB14 coatings have been deposited by DC magnetron sputtering from elemental targets on Si (001), Al2O3 (0001) and MgO (001) substrates at temperatures in the range of 25-350 degrees C. The structural and mechanical properties of AlMgB14 films were characterized by X-ray diffraction, scanning electron microscopy, nanoindentation, and analyzed as a function of deposition conditions and substrate materials. The results show that all films are X-ray amorphous, and the mechanical properties of the deposited films depend on the substrate and growth temperature. AlMgB14 thin films deposited at 350 degrees C are found to have smoother surfaces and containing more well-formed B-12 icosahedra than the films deposited at lower temperature, which consequently increase the hardness of the deposited films. The maximum hardness and Youngs modulus of the as-deposited films are about 32.3 GPa and 310 GPa, respectively, for films deposited on Al2O3 substrate at 350 degrees C.
Ämnesord
- NATURVETENSKAP -- Kemi -- Oorganisk kemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Inorganic Chemistry (hsv//eng)
Nyckelord
- Boride; Physical vapor deposition; Nanoindentation; Sputter-deposition; X-ray diffraction
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
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