Mass-spectrometry of the positive-ion flux during radio-frequency sputter deposition of alumina-zirconia nanocomposites

Trinh, David Huy, 1981- (författare): Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan

Hultman, Lars (författare): Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan

Högberg, Hans (författare): Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan

(creator_code:org_t)

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Abstract Ämnesord

Stäng

The flux of positive ions during radio-frequency magnetron sputter deposition of zirconium oxide and aluminium oxide has been studied by mass-spectrometry. Deposition from single ceramic and metallic targets as well as the combined process containing two targets has been investigated. The ratio of metal-oxide clusters to purely metallic ions in the plasma was measured. For metallic targets, this ratio increased for increasing pressure, while for ceramic targets the ratio remained constant at a level lower than that for the metallic targets. The increase in the proportion of clusters when comparing between sputtering from metallic and ceramic targets is linked to the formation of stoichiometric films in the former case. The amount of oxygen ions in the plasma available for the formation of the film was also studied and found to be reduced when sputtering two targets instead of one, increasing the likelihood of the formation of oxygen deficient films. The positive ion energy distributions for metallic ions in the aluminium and zirconium oxide systems and the dependence of plasma potential on the total pressure are also reported.

Av författaren/redakt...: Trinh, David Huy ...; Hultman, Lars; Högberg, Hans

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