Sökning: id:"swepub:oai:DiVA.org:liu-43526" > Chloride-based SiC ...
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000 | 02354naa a2200337 4500 | |
001 | oai:DiVA.org:liu-43526 | |
003 | SwePub | |
008 | 091010s2009 | |||||||||||000 ||eng| | |
024 | 7 | a https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-435262 URI |
024 | 7 | a https://doi.org/10.4028/www.scientific.net/MSF.615-617.892 DOI |
040 | a (SwePub)liu | |
041 | a engb eng | |
042 | 9 SwePub | |
072 | 7 | a ref2 swepub-contenttype |
072 | 7 | a kon2 swepub-publicationtype |
100 | 1 | a Pedersen, Henrik,d 1981-u Linköpings universitet,Tekniska högskolan,Halvledarmaterial4 aut0 (Swepub:liu)henpe50 |
245 | 1 0 | a Chloride-based SiC epitaxial growth |
264 | 1 | b Trans Tech Publications,c 2009 |
338 | a print2 rdacarrier | |
520 | a Some aspects of the chloride-based CVD growth process have been investigated by using both the approach to add HCl to the standard precursors or/and by using the single molecule precursor methyltrichlorosilane (MTS). The efficiency of the process for different precursors, the growth rate stability and the effect that the Cl/Si-ratio has on the growth have been studied. MTS is showed to be the most efficient precursor; the growth can be hindered by to much chlorine in the gas mixture. The Cl/Si-ratio is also found to be a process parameter that affects the amount of incorporated nitrogen in the epilayers. | |
653 | a NATURAL SCIENCES | |
653 | a NATURVETENSKAP | |
700 | 1 | a Leone, Stefano,d 1978-u Linköpings universitet,Tekniska högskolan,Halvledarmaterial4 aut0 (Swepub:liu)stele19 |
700 | 1 | a Henry, Anne,d 1959-u Linköpings universitet,Tekniska högskolan,Halvledarmaterial4 aut0 (Swepub:liu)annhe32 |
700 | 1 | a Beyer, Franziska,d 1980-u Linköpings universitet,Tekniska högskolan,Halvledarmaterial4 aut0 (Swepub:liu)frabe40 |
700 | 1 | a Lundskog, Anders,d 1981-u Linköpings universitet,Tekniska högskolan,Halvledarmaterial4 aut0 (Swepub:liu)andlu37 |
700 | 1 | a Janzén, Erik,d 1954-u Linköpings universitet,Tekniska högskolan,Halvledarmaterial4 aut0 (Swepub:liu)erija14 |
710 | 2 | a Linköpings universitetb Tekniska högskolan4 org |
773 | 0 | t Materials Science Forum Vols. 615-617d : Trans Tech Publicationsg , s. 89-q <89- |
856 | 4 8 | u https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-43526 |
856 | 4 8 | u https://doi.org/10.4028/www.scientific.net/MSF.615-617.89 |
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