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Mechanism for rapid thermal annealing improvements in undoped GaNxAs1-x/GaAs structures grown by molecular beam epitaxy

Buyanova, Irina, 1960- (author)
Linköpings universitet,Tekniska högskolan,Funktionella elektroniska material
Pozina, Galia, 1966- (author)
Linköpings universitet,Tekniska högskolan,Halvledarmaterial
Hai, P. N. (author)
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Thinh, N. Q. (author)
Bergman, Peder, 1961- (author)
Linköpings universitet,Tekniska högskolan,Halvledarmaterial
Chen, Weimin, 1959- (author)
Linköpings universitet,Tekniska högskolan,Funktionella elektroniska material
Xin, H. P. (author)
Tu, C. W. (author)
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 (creator_code:org_t)
AIP Publishing, 2000
2000
English.
In: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 77:15, s. 2325-
  • Journal article (peer-reviewed)
Abstract Subject headings
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  •  A systematic investigation of the effect of rapid thermal annealing (RTA) on optical properties of undoped GaNAs/GaAs structures is reported. Two effects are suggested to account for the observed dramatic improvement in the quality of the GaNxAs1-x/GaAs quantum structures after RTA: (i) improved composition uniformity of the GaNxAs1-x alloy, deduced from the photoluminescence (PL), PL excitation and time-resolved measurements; and (ii) significant reduction in the concentration of competing nonradiative defects, revealed by the optically detected magnetic resonance studies.

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NATURAL SCIENCES
NATURVETENSKAP

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