id:"swepub:oai:DiVA.org:mdh-3118"
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| Fältnamn | Indikatorer | Metadata |
|---|---|---|
| 000 | 04411naa a2200613 4500 | |
| 001 | oai:DiVA.org:mdh-3118 | |
| 003 | SwePub | |
| 008 | 080331s2004 | |||||||||||000 ||eng| | |
| 009 | oai:DiVA.org:kth-23472 | |
| 024 | 7 | a https://urn.kb.se/resolve?urn=urn:nbn:se:mdh:diva-31182 URI |
| 024 | 7 | a https://doi.org/10.1063/1.17554412 DOI |
| 024 | 7 | a https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-234722 URI |
| 040 | a (SwePub)mdhd (SwePub)kth | |
| 041 | a engb eng | |
| 042 | 9 SwePub | |
| 072 | 7 | a ref2 swepub-contenttype |
| 072 | 7 | a art2 swepub-publicationtype |
| 100 | 1 | a Hansson, B. A. M.u KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden4 aut0 (Swepub:kth)- |
| 245 | 1 0 | a Characterisation of a liquid-xenon jet laser-plasma extreme-ultraviolet source |
| 264 | 1 | b AIP Publishing,c 2004 |
| 338 | a print2 rdacarrier | |
| 500 | a Emmanuelle Janin is the birthname of Emmanuelle Göthelid. | |
| 500 | a QC 20100525, QC 20111011 | |
| 520 | a A liquid-xenon-jet laser-plasma source for extreme-ultraviolet (EUV) and soft-x-ray generation has been characterized. Being a source candidate for EUV lithography (EUVL), we especially focus on parameters important for the integration of the source in EUVL systems. The deep-ultraviolet (DUV) out-of-band radiation (=120–400 nm) was quantified, to within a factor of two, using a flying-circus tool together with a transmission-grating spectrograph resulting in a total DUV conversion efficiency (CE) of ~0.33%/2sr. The size and the shape of the xenon plasma was investigated using an in-band-only EUV microscope, based on a spherical Mo/Si multilayer mirror and a charge-coupled device detector. Scalability of the source size from 20–270 µm full width at half maximum was shown. The maximum repetition-rate sustainable by the liquid-xenon-jet target was simulated by a double-pulse experiment indicating feasibility of >17 kHz operation. The xenon-ion energy distribution from the plasma was determined in a time-of-flight experiment with a Faraday-cup detector showing the presence of multi-kilo-electron-volt ions. Sputtering of silicon witness plates exposed to the plasma was observed, while a xenon background of >1 mbar was shown to eliminate the sputtering. It is concluded that the source has potential to meet the requirements of future EUVL systems. | |
| 650 | 7 | a NATURVETENSKAPx Fysikx Fusion, plasma och rymdfysik0 (SwePub)103032 hsv//swe |
| 650 | 7 | a NATURAL SCIENCESx Physical Sciencesx Fusion, Plasma and Space Physics0 (SwePub)103032 hsv//eng |
| 650 | 7 | a NATURVETENSKAPx Fysik0 (SwePub)1032 hsv//swe |
| 650 | 7 | a NATURAL SCIENCESx Physical Sciences0 (SwePub)1032 hsv//eng |
| 653 | a molybdenum | |
| 653 | a silicon | |
| 653 | a multilayers | |
| 653 | a plasma jets | |
| 653 | a ultraviolet lithography | |
| 653 | a ultraviolet radiation effects | |
| 653 | a time of flight spectra | |
| 653 | a plasma production by laser | |
| 653 | a ultraviolet sources | |
| 653 | a Plasma physics | |
| 653 | a Plasmafysik | |
| 700 | 1 | a Hemberg, O.u KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden4 aut0 (Swepub:kth)u16lyvg0 |
| 700 | 1 | a Hertz, Hans M.u KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden4 aut0 (Swepub:kth)u10uiefj |
| 700 | 1 | a Berglund, Magnusu Roy. Inst. of Technology/Albanova, Sweden4 aut |
| 700 | 1 | a Choi, H. J.u KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden4 aut0 (Swepub:kth)- |
| 700 | 1 | a Jacobsson, Björnu KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden4 aut0 (Swepub:kth)u1bulnxl |
| 700 | 1 | a Janin, E.u KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden4 aut0 (Swepub:kth)- |
| 700 | 1 | a Mosesson, Sofiau KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden4 aut0 (Swepub:kth)u1xrkwkm |
| 700 | 1 | a Rymell, L.u KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden4 aut0 (Swepub:kth)- |
| 700 | 1 | a Thoresen, J.u KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden4 aut0 (Swepub:kth)- |
| 700 | 1 | a Wilner, M.u KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden4 aut0 (Swepub:kth)- |
| 710 | 2 | a KTHb Fysik4 org |
| 773 | 0 | t Review of Scientific Instrumentsd : AIP Publishingg 75:6, s. 2122-2129q 75:6<2122-2129x 0034-6748x 1089-7623 |
| 856 | 4 8 | u https://urn.kb.se/resolve?urn=urn:nbn:se:mdh:diva-3118 |
| 856 | 4 8 | u https://doi.org/10.1063/1.1755441 |
| 856 | 4 8 | u https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-23472 |
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