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Low-Frequency Noise in Nanowire and Planar III-V MOSFETs
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- Hellenbrand, Markus (author)
- Lund University,Lunds universitet,Institutionen för elektro- och informationsteknik,Institutioner vid LTH,Lunds Tekniska Högskola,Nanoelektronik,Forskargrupper vid Lunds universitet,Department of Electrical and Information Technology,Departments at LTH,Faculty of Engineering, LTH,Nano Electronics,Lund University Research Groups
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- Kilpi, Olli-Pekka (author)
- Lund University,Lunds universitet,Institutionen för elektro- och informationsteknik,Institutioner vid LTH,Lunds Tekniska Högskola,Nanoelektronik,Forskargrupper vid Lunds universitet,Department of Electrical and Information Technology,Departments at LTH,Faculty of Engineering, LTH,Nano Electronics,Lund University Research Groups
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- Svensson, Johannes (author)
- Lund University,Lunds universitet,Institutionen för elektro- och informationsteknik,Institutioner vid LTH,Lunds Tekniska Högskola,Nanoelektronik,Forskargrupper vid Lunds universitet,Department of Electrical and Information Technology,Departments at LTH,Faculty of Engineering, LTH,Nano Electronics,Lund University Research Groups
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- (creator_code:org_t)
- Elsevier BV, 2019
- 2019
- English.
- In: Microelectronic Engineering. - : Elsevier BV. - 0167-9317.
- Journal article (peer-reviewed)
Abstract
Subject headings
Close
- Nanowire geometries are leading contenders for future low-power transistor design. In this study, low-frequency noise is measured and evaluated in highly scaled III-V nanowire metal-oxide-semiconductor field-effect transistors (MOSFETs) and in planar III-V MOSFETs to investigate to what extent the device geometry affects the noise performance. Number fluctuations are identified as the dominant noise mechanism in both architectures. In order to perform a thorough comparison of the two architectures, a discussion of the underlying noise model is included. We find that the noise performance of the MOSFETs in a nanowire architecture is at least comparable to the planar devices. The input-referred voltage noise in the nanowire devices is superior by at least a factor of four.
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Nanoteknik -- Nanoteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Nano-technology -- Nano-technology (hsv//eng)
Keyword
- III-V
- Nanowire (NW)
- MOSFET
- Low-Frequency Noise
- Gate Oxide Defects
- Border Traps
Publication and Content Type
- art (subject category)
- ref (subject category)
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