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Fabrication of grap...
Fabrication of graphene quantum hall resistance standard in a cryogen-Table-Top system
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- He, Hans, 1989 (författare)
- RISE,Mätteknik,Chalmers, Sweden
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- Janssen, Tjbm (författare)
- National Physical Laboratory (NPL),NPL National Physical Laboratory, UK,National Phys Lab, England
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- Rozhko, S. (författare)
- National Physical Laboratory (NPL),NPL National Physical Laboratory, UK,National Phys Lab, England
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- Tzalenchuk, A.Y. (författare)
- Royal Holloway University of London,National Physical Laboratory (NPL),NPL National Physical Laboratory, UK; University of London, UK,National Phys Lab, England; Royal Holloway University of London, England
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- Lara Avila, Samuel, 1983 (författare)
- Chalmers tekniska högskola,Chalmers University of Technology,Chalmers University of Technology, Sweden
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- Yakimova, Rositsa (författare)
- Linköpings universitet,Halvledarmaterial,Tekniska fakulteten
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- Kubatkin, Sergey, 1959 (författare)
- Chalmers tekniska högskola,Chalmers University of Technology,Chalmers University of Technology, Sweden
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(creator_code:org_t)
- ISBN 9781467391344
- Institute of Electrical and Electronics Engineers Inc. 2016
- 2016
- Engelska.
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Ingår i: 2016 Conference on Precision Electromagnetic Measurements, CPEM 2016; The Westin OttawaOttawa; Canada; 10-15 July 2016. - : Institute of Electrical and Electronics Engineers Inc.. - 9781467391344 ; , s. Art no 7540516-
- Relaterad länk:
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http://dx.doi.org/10...
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https://doi.org/10.1...
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https://research.cha...
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https://urn.kb.se/re...
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https://urn.kb.se/re...
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Abstract
Ämnesord
Stäng
- We have demonstrated quantum Hall resistance measurements with metrological accuracy in a relatively easy to use and compact cryogen-free system operating at a temperature of around 3.8 K and magnetic field below 5 T. This advance in technology is due to the unique properties of epitaxial graphene on silicon carbide (SiC) which lifts the stringent requirements for quantum hall effect seen in conventional semiconductors. This paper presents the processes involved in fabrication and characterization of metrologically viable epitaxial graphene samples.
Ämnesord
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
- TEKNIK OCH TEKNOLOGIER -- Materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering (hsv//eng)
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik -- Annan elektroteknik och elektronik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering -- Other Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
Nyckelord
- measurement standards
- Graphene
- quantum hall effect
- microfabrication
- Epitaxial layers
Publikations- och innehållstyp
- kon (ämneskategori)
- ref (ämneskategori)
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