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LIBRIS Formathandbok  (Information om MARC21)
FältnamnIndikatorerMetadata
00002974naa a2200457 4500
001oai:DiVA.org:kth-23868
003SwePub
008100810s2004 | |||||||||||000 ||eng|
024a https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-238682 URI
024a https://doi.org/10.1063/1.18075672 DOI
040 a (SwePub)kth
041 a engb eng
042 9 SwePub
072 7a ref2 swepub-contenttype
072 7a art2 swepub-publicationtype
100a Legall, H.4 aut
2451 0a Spatial and spectral characterization of a laser produced plasma source for extreme ultraviolet metrology
264 1b AIP Publishing,c 2004
338 a print2 rdacarrier
500 a QC 20100525
520 a We present a laser produced plasma (LPP) source optimized for metrology and the results of its radiometric characterization. The presented (LPP) source can be used for reflectometry and spectroscopy in the soft x-ray range. For these applications, stable operation with high spectral photon yields high reliability in continuous operation and, to reach high spectral resolution, a small source size and high source point stability is necessary. For the characterization of the source, special instruments have been designed and calibrated using the soft x-ray radiometry beamline of the Physikalisch-Technische-Bundesanstalt at BESSY. These instruments are an imaging spectrometer, a double multilayer tool for in-band power measurements, a transmission slit grating spectrograph, and a pinhole camera. From the measurements a source size of 30 mumx55 mum (2sigma, horizontal by vertical) and a stability of better than 5 mum horizontally and 9 mum vertically were obtained. The source provides a flat continuous emission in the extreme ultraviolet (EUV) range around 13.4 nm and a spectral photon flux of up to 1*10(14)/(s sr 0.1 nm) at a pump laser pulse energy of 650 mJ. The shot-to-shot stability of the source is about 5% (1sigma) for laser pulse energies above 200 mJ. It is shown that an Au-LPP source provides spectrally reproducible emission with sufficient power at low debris conditions for the operation of a laboratory based EUV reflectometer and for spectroscopy.
653 a x-ray-absorption
653 a laboratory euv reflectometer
653 a high average power
653 a lithography applications
653 a excimer-laser
653 a light-source
653 a spectroscopy
653 a emission
653 a clusters
653 a debris
700a Stiel, H.4 aut
700a Vogt, Ulrich4 aut
700a Schonnagel, H.4 aut
700a Nickles, P. V.4 aut
700a Tummler, J.4 aut
700a Scholz, F.4 aut
700a Scholze, F.4 aut
773t Review of Scientific Instrumentsd : AIP Publishingg 75:11, s. 4981-4988q 75:11<4981-4988x 0034-6748x 1089-7623
8564 8u https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-23868
8564 8u https://doi.org/10.1063/1.1807567

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