Search: onr:"swepub:oai:DiVA.org:kth-23868" > Spatial and spectra...
Fältnamn | Indikatorer | Metadata |
---|---|---|
000 | 02974naa a2200457 4500 | |
001 | oai:DiVA.org:kth-23868 | |
003 | SwePub | |
008 | 100810s2004 | |||||||||||000 ||eng| | |
024 | 7 | a https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-238682 URI |
024 | 7 | a https://doi.org/10.1063/1.18075672 DOI |
040 | a (SwePub)kth | |
041 | a engb eng | |
042 | 9 SwePub | |
072 | 7 | a ref2 swepub-contenttype |
072 | 7 | a art2 swepub-publicationtype |
100 | 1 | a Legall, H.4 aut |
245 | 1 0 | a Spatial and spectral characterization of a laser produced plasma source for extreme ultraviolet metrology |
264 | 1 | b AIP Publishing,c 2004 |
338 | a print2 rdacarrier | |
500 | a QC 20100525 | |
520 | a We present a laser produced plasma (LPP) source optimized for metrology and the results of its radiometric characterization. The presented (LPP) source can be used for reflectometry and spectroscopy in the soft x-ray range. For these applications, stable operation with high spectral photon yields high reliability in continuous operation and, to reach high spectral resolution, a small source size and high source point stability is necessary. For the characterization of the source, special instruments have been designed and calibrated using the soft x-ray radiometry beamline of the Physikalisch-Technische-Bundesanstalt at BESSY. These instruments are an imaging spectrometer, a double multilayer tool for in-band power measurements, a transmission slit grating spectrograph, and a pinhole camera. From the measurements a source size of 30 mumx55 mum (2sigma, horizontal by vertical) and a stability of better than 5 mum horizontally and 9 mum vertically were obtained. The source provides a flat continuous emission in the extreme ultraviolet (EUV) range around 13.4 nm and a spectral photon flux of up to 1*10(14)/(s sr 0.1 nm) at a pump laser pulse energy of 650 mJ. The shot-to-shot stability of the source is about 5% (1sigma) for laser pulse energies above 200 mJ. It is shown that an Au-LPP source provides spectrally reproducible emission with sufficient power at low debris conditions for the operation of a laboratory based EUV reflectometer and for spectroscopy. | |
653 | a x-ray-absorption | |
653 | a laboratory euv reflectometer | |
653 | a high average power | |
653 | a lithography applications | |
653 | a excimer-laser | |
653 | a light-source | |
653 | a spectroscopy | |
653 | a emission | |
653 | a clusters | |
653 | a debris | |
700 | 1 | a Stiel, H.4 aut |
700 | 1 | a Vogt, Ulrich4 aut |
700 | 1 | a Schonnagel, H.4 aut |
700 | 1 | a Nickles, P. V.4 aut |
700 | 1 | a Tummler, J.4 aut |
700 | 1 | a Scholz, F.4 aut |
700 | 1 | a Scholze, F.4 aut |
773 | 0 | t Review of Scientific Instrumentsd : AIP Publishingg 75:11, s. 4981-4988q 75:11<4981-4988x 0034-6748x 1089-7623 |
856 | 4 8 | u https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-23868 |
856 | 4 8 | u https://doi.org/10.1063/1.1807567 |
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