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Nucleation of singl...
Nucleation of single GaN nanorods with diameters smaller than 35 nm by molecular beam epitaxy
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- Chen, Yen-Ting (author)
- Academic Sinica, Taiwan
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- Araki, Tsutomu (author)
- Ritsumeikan University, Japan
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- Palisaitis, Justinas (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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- Persson, Per O A (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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- Chen, Li-Chyong (author)
- National Taiwan University, Taiwan
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- Chen, Kuei-Hsien (author)
- Academic Sinica, Taiwan
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- Holtz, Per-Olof (author)
- Linköpings universitet,Halvledarmaterial,Tekniska högskolan
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- Birch, Jens (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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- Nanishi, Yasushi (author)
- Ritsumeikan University, Japan
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(creator_code:org_t)
- American Institute of Physics (AIP), 2013
- 2013
- English.
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In: Applied Physics Letters. - : American Institute of Physics (AIP). - 0003-6951 .- 1077-3118. ; 103:20, s. 203108-
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https://liu.diva-por... (primary) (Raw object)
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http://liu.diva-port...
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Subject headings
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- Nucleation mechanism of catalyst-free GaN nanorod grown on Si(111) is investigated by the fabrication of uniform and narrow (andlt; 35 nm) nanorods without a pre-defined mask by molecular beam epitaxy. Direct evidences show that the nucleation of GaN nanorods stems from the sidewall of the underlying islands down to the Si(111) substrate, different from commonly reported ones on top of the island directly. Accordingly, the growth and density control of the nanorods is exploited by a "narrow-pass" approach that only narrow nanorod can be grown. The optimal size of surrounding non-nucleation area around single nanorod is estimated as 88 nm.
Keyword
- TECHNOLOGY
- TEKNIKVETENSKAP
Publication and Content Type
- ref (subject category)
- art (subject category)
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