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Sökning: onr:"swepub:oai:research.chalmers.se:eec08a3f-0b6c-46e8-aeae-4177b7e4ed72" > Microstructural Inv...

LIBRIS Formathandbok  (Information om MARC21)
FältnamnIndikatorerMetadata
00004128naa a2200529 4500
001oai:research.chalmers.se:eec08a3f-0b6c-46e8-aeae-4177b7e4ed72
003SwePub
008171007s2010 | |||||||||||000 ||eng|
0247 a https://doi.org/10.1149/1.33914472 DOI
0247 a https://research.chalmers.se/publication/1224092 URI
040 a (SwePub)cth
041 a engb eng
042 9 SwePub
072 7a art2 swepub-publicationtype
072 7a ref2 swepub-contenttype
1001 a Canovic, Sead,d 1979u Chalmers tekniska högskola,Chalmers University of Technology4 aut0 (Swepub:cth)f99seca
2451 0a Microstructural Investigation of the Initial Oxidation of the FeCrAlRE Alloy Kanthal AF in Dry and Wet O-2 at 600 and 800 degrees C
264 1b The Electrochemical Society,c 2010
520 a The FeCrAlRE (where RE is reactive element) alloy Kanthal AF was exposed isothermally at 600 and 800 degrees C for 72 h in dry O-2 and in O-2 with 10 vol % H2O. The mass gains were 3-5 times higher at the higher temperature. The presence of water vapor increased the oxidation rate at 800 degrees C, while no significant effect was observed at 600 degrees C. A thin two-layered oxide formed at 600 degrees C: an outer (Fe, Cr)(2)O-3 corundum-type oxide, containing some Al, and an inner, probably amorphous, Al-rich oxide. At 800 degrees C a two-layered oxide formed in both environments. The inner layer consisted of inward grown alpha-Al2O3. In dry O-2 the originally formed outward grown gamma-Al2O3 had transformed to alpha-Al2O3 after 72 h. Water vapor stabilized the outward grown gamma-Al2O3 and hence no transformation occurred after 72 h in humid environment. RE-rich oxide particles with varying composition (Y, Zr, and Ti) were distributed in the base oxide at both temperatures and in both environments. The RE-rich particles were separated from the alloy substrate by a layer of Al-rich oxide. At 800 degrees C the Y-rich RE particles were surrounded by thick oxide patches in both dry and humid O-2.
650 7a NATURVETENSKAPx Kemix Oorganisk kemi0 (SwePub)104042 hsv//swe
650 7a NATURAL SCIENCESx Chemical Sciencesx Inorganic Chemistry0 (SwePub)104042 hsv//eng
650 7a TEKNIK OCH TEKNOLOGIERx Kemiteknik0 (SwePub)2042 hsv//swe
650 7a ENGINEERING AND TECHNOLOGYx Chemical Engineering0 (SwePub)2042 hsv//eng
653 a 40-percent h2o
653 a 900 degrees-c
653 a mg-incorporation
653 a oxide scales
653 a water-vapor
653 a alumina scales
653 a cyclic oxidation
653 a fecraire alloys
653 a high-temperature oxidation
653 a growth
7001 a Engkvist, Josefin,d 1972u Högskolan i Dalarna,Dalarna university4 aut0 (Swepub:cth)josengk
7001 a Liu, Fang,d 1975u Chalmers tekniska högskola,Chalmers University of Technology4 aut0 (Swepub:cth)fangliu
7001 a Lai, Haiping,d 1979u Chalmers tekniska högskola,Chalmers University of Technology4 aut0 (Swepub:cth)haiping
7001 a Götlind, Helena,d 1978u Chalmers tekniska högskola,Chalmers University of Technology4 aut0 (Swepub:cth)helenaj
7001 a Hellström, Kristina M,d 1971u Chalmers tekniska högskola,Chalmers University of Technology4 aut0 (Swepub:cth)krh
7001 a Svensson, Jan-Erik,d 1965u Chalmers tekniska högskola,Chalmers University of Technology4 aut0 (Swepub:cth)jes
7001 a Johansson, Lars-Gunnar,d 1952u Chalmers tekniska högskola,Chalmers University of Technology4 aut0 (Swepub:cth)lg
7001 a Olsson, M.u Högskolan i Dalarna,Dalarna university4 aut
7001 a Halvarsson, Mats,d 1965u Chalmers tekniska högskola,Chalmers University of Technology4 aut0 (Swepub:cth)f10mh
7102 a Chalmers tekniska högskolab Högskolan i Dalarna4 org
7730 t Journal of the Electrochemical Societyd : The Electrochemical Societyg 157:6, s. C223-C230q 157:6<C223-C230x 1945-7111x 0013-4651
8564 u http://dx.doi.org/10.1149/1.3391447y FULLTEXT
8564 8u https://doi.org/10.1149/1.3391447
8564 8u https://research.chalmers.se/publication/122409

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