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Characterization of Trapping Effects Related to Carbon Doping Level in AlGaN Back-Barriers for AlGaN/GaN HEMTs

Del Castillo, Ragnar Ferrand-Drake (author)
Chalmers Univ Technol, Sweden
Chen, Ding-Yuan (author)
SweGaN AB, S-58278 Linkoping, Sweden
Chen, Jr-Tai (author)
SweGaN AB, S-58278 Linkoping, Sweden
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Thorsell, Mattias (author)
Chalmers Univ Technol, Sweden; SAAB AB, Sweden
Darakchieva, Vanya (author)
Linköpings universitet,Halvledarmaterial,Tekniska fakulteten,Lund Univ, Sweden
Rorsman, Niklas (author)
Chalmers Univ Technol, Sweden
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 (creator_code:org_t)
2024
2024
English.
In: IEEE Transactions on Electron Devices. - : IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC. - 0018-9383 .- 1557-9646.
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • The impact of different carbon concentrations in the Al 0.06 Ga 0.94 N graded back-barrier and GaN buffer of high electron mobility transistors (HEMTs) is investigated. Four epi-wafers with different carbon concentrations, ranging from 1 x 10(17) to 5 x 10(17) cm( -3) , were grown by metal organic chemical vapor deposition (MOCVD). HEMTs with 100 and 200 nm gate lengths were fabricated and characterized with dc, Pulsed-IV, drain current transient spectroscopy (DCTS), and large-signal measurements at 30 GHz. It is shown that the back-barrier effectively prevents buffer-related electron trapping. The highest C-doping provides the best 2DEG confinement, while lower carbon doping levels are beneficial for a high output power and efficiency. A C-doping of 1 x 10(17)cm( -3) offers the highest output power at maximum power added efficiency (PAE) (1.8 W/mm), whereas 3 x 10(17) cm( -3) doping provides the highest PAE ( > 40%). The C-profiles acquired by using secondary ion mass spectroscopy (SIMS), in combination with DCTS, is used to explain the electron trapping effects. Traps associated with the C-doping in the back-barrier are identified and the bias ranges for the trap activation are discussed. The study shows the importance of considering the C-doping level in the back-barrier of microwave GaN HEMTs for power amplification and generation.

Subject headings

NATURVETENSKAP  -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
NATURAL SCIENCES  -- Physical Sciences -- Condensed Matter Physics (hsv//eng)

Keyword

MODFETs; HEMTs; Electrons; Logic gates; Wide band gap semiconductors; Aluminum gallium nitride; Epitaxial growth; AlGaN/GaN; back-barrier; dispersion; double heterostructure; high electron mobility transistors (HEMTs); short channel effect (SCE)

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