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Roadmap on ferroele...
Roadmap on ferroelectric hafnia- and zirconia-based materials and devices
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- Silva, José P.B. (author)
- University of Minho
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- Alcala, Ruben (author)
- NaMLab gGmbH
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- Avci, Uygar E. (author)
- Intel Corporation, USA
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- Barrett, Nick (author)
- University of Paris-Saclay
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- Bégon-Lours, Laura (author)
- IBM Research Zurich
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- Borg, Mattias (author)
- Lund University,Lunds universitet,NanoLund: Centre for Nanoscience,Annan verksamhet, LTH,Lunds Tekniska Högskola,Nanoelektronik,Forskargrupper vid Lunds universitet,LTH profilområde: Nanovetenskap och halvledarteknologi,LTH profilområden,LTH profilområde: AI och digitalisering,Other operations, LTH,Faculty of Engineering, LTH,Nano Electronics,Lund University Research Groups,LTH Profile Area: Nanoscience and Semiconductor Technology,LTH Profile areas,Faculty of Engineering, LTH,LTH Profile Area: AI and Digitalization,Faculty of Engineering, LTH
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- Byun, Seungyong (author)
- Seoul National University
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- Chang, Sou Chi (author)
- Intel Corporation, USA
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- Cheong, Sang Wook (author)
- Rutgers Center for Emergent Materials
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- Choe, Duk Hyun (author)
- Samsung Advanced Institute of Technology (SAIT)
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- Coignus, Jean (author)
- University Grenoble Alpes
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- Deshpande, Veeresh (author)
- Helmholtz Association of German Research Centers
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- Dimoulas, Athanasios (author)
- National Centre for Scientific Research Demokritos
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- Dubourdieu, Catherine (author)
- Free University of Berlin
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- Fina, Ignasi (author)
- CSIC - Instituto de Ciencia de Materiales de Barcelona (ICMAB)
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- Funakubo, Hiroshi (author)
- Tokyo Institute of Technology
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- Grenouillet, Laurent (author)
- University Grenoble Alpes
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- Gruverman, Alexei (author)
- University of Nebraska - Lincoln
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- Heo, Jinseong (author)
- Samsung Advanced Institute of Technology (SAIT)
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- Hoffmann, Michael (author)
- University of California, Berkeley
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- Hsain, H. Alex (author)
- North Carolina State University
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- Huang, Fei Ting (author)
- Rutgers Center for Emergent Materials
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- Hwang, Cheol Seong (author)
- Seoul National University
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- Íñiguez, Jorge (author)
- University of Luxembourg
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- Jones, Jacob L. (author)
- North Carolina State University
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- Karpov, Ilya V. (author)
- Intel Corporation, USA
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- Kersch, Alfred (author)
- Munich University of Applied Sciences
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- Kwon, Taegyu (author)
- Seoul National University
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- Lancaster, Suzanne (author)
- NaMLab gGmbH
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- Lederer, Maximilian (author)
- Center Nanoelectronic Technologies (CNT)
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- Lee, Younghwan (author)
- North Carolina State University
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- Lomenzo, Patrick D. (author)
- NaMLab gGmbH
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- Martin, Lane W. (author)
- University of California, Berkeley
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- Martin, Simon (author)
- University Grenoble Alpes
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- Migita, Shinji (author)
- National Institute of Advanced Industrial Science and Technology (AIST)
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- Mikolajick, Thomas (author)
- NaMLab gGmbH
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- Noheda, Beatriz (author)
- University of Groningen
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- Park, Min Hyuk (author)
- Seoul National University
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- Rabe, Karin M. (author)
- Rutgers University: The State University of New Jersey
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- Salahuddin, Sayeef (author)
- Lawrence Berkeley National Laboratory
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- Sánchez, Florencio (author)
- CSIC - Instituto de Ciencia de Materiales de Barcelona (ICMAB)
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- Seidel, Konrad (author)
- Center Nanoelectronic Technologies (CNT)
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- Shimizu, Takao (author)
- Tokyo Institute of Technology
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- Shiraishi, Takahisa (author)
- Tokyo Institute of Technology
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- Slesazeck, Stefan (author)
- NaMLab gGmbH
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- Toriumi, Akira (author)
- University of Tokyo
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- Uchida, Hiroshi (author)
- Sophia University
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- Vilquin, Bertrand (author)
- University of Lyon
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- Xu, Xianghan (author)
- Princeton University
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- Ye, Kun Hee (author)
- Seoul National University
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- Schroeder, Uwe (author)
- NaMLab gGmbH
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(creator_code:org_t)
- 2023
- 2023
- English.
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In: APL Materials. - 2166-532X. ; 11:8
- Related links:
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http://dx.doi.org/10... (free)
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https://lup.lub.lu.s...
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https://doi.org/10.1...
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Abstract
Subject headings
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- Ferroelectric hafnium and zirconium oxides have undergone rapid scientific development over the last decade, pushing them to the forefront of ultralow-power electronic systems. Maximizing the potential application in memory devices or supercapacitors of these materials requires a combined effort by the scientific community to address technical limitations, which still hinder their application. Besides their favorable intrinsic material properties, HfO2-ZrO2 materials face challenges regarding their endurance, retention, wake-up effect, and high switching voltages. In this Roadmap, we intend to combine the expertise of chemistry, physics, material, and device engineers from leading experts in the ferroelectrics research community to set the direction of travel for these binary ferroelectric oxides. Here, we present a comprehensive overview of the current state of the art and offer readers an informed perspective of where this field is heading, what challenges need to be addressed, and possible applications and prospects for further development.
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik -- Annan elektroteknik och elektronik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering -- Other Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
Publication and Content Type
- art (subject category)
- ref (subject category)
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To the university's database
- By the author/editor
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Silva, José P.B.
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Alcala, Ruben
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Avci, Uygar E.
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Barrett, Nick
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Bégon-Lours, Lau ...
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Borg, Mattias
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show more...
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Byun, Seungyong
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Chang, Sou Chi
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Cheong, Sang Woo ...
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Choe, Duk Hyun
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Coignus, Jean
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Deshpande, Veere ...
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Dimoulas, Athana ...
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Dubourdieu, Cath ...
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Fina, Ignasi
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Funakubo, Hirosh ...
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Grenouillet, Lau ...
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Gruverman, Alexe ...
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Heo, Jinseong
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Hoffmann, Michae ...
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Hsain, H. Alex
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Huang, Fei Ting
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Hwang, Cheol Seo ...
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Íñiguez, Jorge
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Jones, Jacob L.
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Karpov, Ilya V.
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Kersch, Alfred
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Kwon, Taegyu
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Lancaster, Suzan ...
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Lederer, Maximil ...
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Lee, Younghwan
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Lomenzo, Patrick ...
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Martin, Lane W.
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Martin, Simon
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Migita, Shinji
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Mikolajick, Thom ...
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Noheda, Beatriz
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Park, Min Hyuk
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Rabe, Karin M.
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Salahuddin, Saye ...
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Sánchez, Florenc ...
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Seidel, Konrad
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Shimizu, Takao
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Shiraishi, Takah ...
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Slesazeck, Stefa ...
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Toriumi, Akira
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Uchida, Hiroshi
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Vilquin, Bertran ...
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Xu, Xianghan
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Ye, Kun Hee
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Schroeder, Uwe
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- About the subject
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- ENGINEERING AND TECHNOLOGY
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ENGINEERING AND ...
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and Electrical Engin ...
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and Other Electrical ...
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APL Materials
- By the university
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Lund University