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LIBRIS Formathandbok (Information om MARC21)
| Fältnamn | Indikatorer | Metadata |
|---|---|---|
| 000 | 03025naa a2200409 4500 | |
| 001 | oai:DiVA.org:uu-299731 | |
| 003 | SwePub | |
| 008 | 160726s2016 | |||||||||||000 ||eng| | |
| 024 | 7 | a https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-2997312 URI |
| 024 | 7 | a https://doi.org/10.3390/coatings60200192 DOI |
| 040 | a (SwePub)uu | |
| 041 | a engb eng | |
| 042 | 9 SwePub | |
| 072 | 7 | a ref2 swepub-contenttype |
| 072 | 7 | a art2 swepub-publicationtype |
| 100 | 1 | a Cindemir, Umutu Uppsala universitet,Fasta tillståndets fysik4 aut0 (Swepub:uu)umuci358 |
| 245 | 1 0 | a Sputter-Deposited Indium-Tin Oxide Thin Films for Acetaldehyde Gas Sensing |
| 264 | c 2016-04-14 | |
| 264 | 1 | b MDPI AG,c 2016 |
| 338 | a electronic2 rdacarrier | |
| 520 | a Reactive dual-target DC magnetron sputtering was used to prepare In-Sn oxide thin films with a wide range of compositions. The films were subjected to annealing post-treatment at 400 degrees C or 500 degrees C for different periods of time. Compositional and structural characterizations were performed by X-ray photoelectron spectroscopy, energy dispersive X-ray spectroscopy, X-ray diffraction, Rutherford backscattering and scanning electron microscopy. Films were investigated for gas sensing at 200 degrees C by measuring their resistance response upon exposure to acetaldehyde mixed with synthetic air. We found that the relative indium-to-tin content was very important and that measurable sensor responses could be recorded at acetaldehyde concentrations down to 200 ppb, with small resistance drift between repeated exposures, for both crystalline SnO2-like films and for amorphous films consisting of about equal amounts of In and Sn. We also demonstrated that it is not possible to prepare crystalline sensors with intermediate indium-to-tin compositions by sputter deposition and post-annealing up to 500 degrees C. | |
| 650 | 7 | a TEKNIK OCH TEKNOLOGIERx Materialteknik0 (SwePub)2052 hsv//swe |
| 650 | 7 | a ENGINEERING AND TECHNOLOGYx Materials Engineering0 (SwePub)2052 hsv//eng |
| 653 | a indium tin oxide | |
| 653 | a magnetron sputtering | |
| 653 | a gas sensor | |
| 653 | a acetaldehyde | |
| 700 | 1 | a Lansåker, Pia C.u Uppsala universitet,Fasta tillståndets fysik4 aut0 (Swepub:uu)piala732 |
| 700 | 1 | a Österlund, Larsu Uppsala universitet,Fasta tillståndets fysik4 aut0 (Swepub:uu)laros288 |
| 700 | 1 | a Niklasson, Gunnar A.u Uppsala universitet,Fasta tillståndets fysik4 aut0 (Swepub:uu)gni26208 |
| 700 | 1 | a Granqvist, Claes-Göranu Uppsala universitet,Fasta tillståndets fysik4 aut0 (Swepub:uu)cgr25299 |
| 710 | 2 | a Uppsala universitetb Fasta tillståndets fysik4 org |
| 773 | 0 | t Coatingsd : MDPI AGg 6:2q 6:2x 2079-6412 |
| 856 | 4 | u https://uu.diva-portal.org/smash/get/diva2:949989/FULLTEXT01.pdfx primaryx Raw objecty fulltext:print |
| 856 | 4 | u https://www.mdpi.com/2079-6412/6/2/19/pdf |
| 856 | 4 8 | u https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-299731 |
| 856 | 4 8 | u https://doi.org/10.3390/coatings6020019 |
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- Cindemir, Umut
- Lansåker, Pia C.
- Österlund, Lars
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