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High resolution full-field imaging of nanostructures using compact extreme ultraviolet lasers

Brizuela, F. (author)
Brewer, C. (author)
Fernandez, S. (author)
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Martz, Dale (author)
NSF Engineering Research Center for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Colorado State University
Marconi, M. (author)
Chao, W. (author)
Anderson, E. H. (author)
Vinogradov, A. V. (author)
Artyukov, I. A. (author)
Ponomareko, A. G. (author)
Kondratenko, V. V. (author)
Attwood, D. T. (author)
Bertness, K. A. (author)
Sanford, N. A. (author)
Rocca, J. J. (author)
Menonil, C. S. (author)
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 (creator_code:org_t)
2009-09-25
2009
English.
In: 9TH INTERNATIONAL CONFERENCE ON X-RAY MICROSCOPY. - : IOP Publishing.
  • Conference paper (peer-reviewed)
Abstract Subject headings
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  • Recent advances in the development of high peak brightness table-top extreme ultraviolet (EUV) and soft x-ray (SRX) lasers have opened new opportunities for the demonstration of compact full-field EUV/SXR microscopes capable of capturing images with short exposures down to a single laser shot. We demonstrate the practical application of table-top zone plate EUV microscopes that can image nanostructures with a spatial resolution of 54 nm and below and exposure times as short as 1.2 ns, the duration of a single laser shot.

Subject headings

TEKNIK OCH TEKNOLOGIER  -- Annan teknik (hsv//swe)
ENGINEERING AND TECHNOLOGY  -- Other Engineering and Technologies (hsv//eng)

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