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Structural and morp...
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Khranovskyy, V.Institute for Problems of Material Science, Krzhyzhanovskyy str. 3, 03142 Kiev, Ukraine, University of Oslo, Physics Department, Centre for Materials Science and Nanotechnology, N-0316 Oslo, Norway
(författare)
Structural and morphological properties of ZnO : Ga thin films
- Artikel/kapitelEngelska2006
Förlag, utgivningsår, omfång ...
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Elsevier BV,2006
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printrdacarrier
Nummerbeteckningar
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LIBRIS-ID:oai:DiVA.org:liu-50103
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https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-50103URI
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https://doi.org/10.1016/j.tsf.2005.12.269DOI
Kompletterande språkuppgifter
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Språk:engelska
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Sammanfattning på:engelska
Ingår i deldatabas
Klassifikation
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Ämneskategori:ref swepub-contenttype
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Ämneskategori:art swepub-publicationtype
Anmärkningar
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Zinc oxide (ZnO) is a promising semiconductor material with a great variety of applications. Compared to undoped ZnO, impurity-doped ZnO has a lower resistivity and better stability. With this aim, Ga has been proposed as a dopant. In this study, the structural characteristics and surface morphology of ZnO films produced by PEMOCVD at a substrate temperature of 250 °C on the c-plane (001) of sapphire were investigated. Doping was realized with 1, 3, 5 and 10 wt.% of Ga2(AA)3 in the precursor's mixture. At lower contents, Ga stimulates growth of (002) oriented textured films and the smallest FWHM was obtained as low as 0.17° for ZnO:Ga with 1 wt.%. A change in preferential orientation as well as surface smoothing and roughness decreasing of the films were observed with further increasing Ga content in precursor's mixture. We assume a key role of Ga and note that such a feature would be beneficial for the application of ZnO thin films for formation of abrupt junctions in p-n device structures. © 2005 Elsevier B.V. All rights reserved.
Ämnesord och genrebeteckningar
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AFM
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PEMOCVD
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XRD
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ZnO doped by Ga
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NATURAL SCIENCES
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NATURVETENSKAP
Biuppslag (personer, institutioner, konferenser, titlar ...)
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Grossner, U.University of Oslo, Physics Department, Centre for Materials Science and Nanotechnology, N-0316 Oslo, Norway
(författare)
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Nilsen, O.University of Oslo, Chemistry Department, Centre for Materials Science and Nanotechnology, N-0316 Oslo, Norway
(författare)
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Lazorenko, V.Institute for Problems of Material Science, Krzhyzhanovskyy str. 3, 03142 Kiev, Ukraine
(författare)
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Lashkarev, G.V.Institute for Problems of Material Science, Krzhyzhanovskyy str. 3, 03142 Kiev, Ukraine
(författare)
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Svensson, B.G.University of Oslo, Physics Department, Centre for Materials Science and Nanotechnology, N-0316 Oslo, Norway
(författare)
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Yakimova, RositsaLinköpings universitet,Halvledarmaterial,Tekniska högskolan(Swepub:liu)rosia15
(författare)
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Institute for Problems of Material Science, Krzhyzhanovskyy str. 3, 03142 Kiev, Ukraine, University of Oslo, Physics Department, Centre for Materials Science and Nanotechnology, N-0316 Oslo, NorwayUniversity of Oslo, Physics Department, Centre for Materials Science and Nanotechnology, N-0316 Oslo, Norway
(creator_code:org_t)
Sammanhörande titlar
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Ingår i:Thin Solid Films: Elsevier BV515:2 SPEC. ISS., s. 472-4760040-60901879-2731
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