WFRF:(Zhang Bin Bin)
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Influence of a Si layer intercalated between Si0.75Ge0.25 and Ni on the behavior of the resulting NiSi1-uGeu film
- Seger, Johan (author)
-
- Jarmar, Tobias (author)
- Uppsala universitet,Institutionen för teknikvetenskaper,Materialvetenskap
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- Ericson, Fredric (author)
- Uppsala universitet,Institutionen för teknikvetenskaper,Materialvetenskap
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- Hållstedt, Julius (author)
- Zhang, Zhi-Bin (author)
- Zhang, Shi-Li (author)
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- (creator_code:org_t)
- 2004
- 2004
- Undefined language.
- In: Journal of Applied Physics. ; 96, s. 7179-7182
- Journal article (peer-reviewed)
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- Jarmar, Tobias
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