Growth and properties of amorphous Ti-B-Si-N thin films deposited by hybrid HIPIMS/DC-magnetron co-sputtering from TiB2 and Si targets

Fager, HannaLinköpings universitet,Tunnfilmsfysik,Tekniska högskolan (författare)

Amorphous nitrides are explored for their homogenous structure and potential use as wear-resistant coatings, beyond their much studied nano-and microcrystalline counterparts. (TiB2)1−xSixNy thin films were deposited on Si(001) substrates by a hybrid technique of high power impulse magnetron sputtering (HIPIMS) combined with dc magnetron sputtering (DCMS) using TiB2 and Si targets in a N2/Ar atmosphere. By varying the sputtering dc power to the Si target from 200 to 2000 W while keeping the average power to the TiB2-target, operated in HIPIMS mode, constant at 4000 W, the Si content in the films increased gradually from x=0.01 to x=0.43. The influence of the Si content on the microstructure, phase constituents, and mechanical properties were systematically investigated. The results show that the microstructure of as-deposited (TiB2)1−xSixNy films changes from nanocrystalline with 2-4 nm TiN grains for x=0.01 to fully electron diffraction amorphous for x=0.22. With increasing Si content, the hardness of the films increases from 8.5 GPa with x=0.01 to 17.2 GPa with x=0.43.

Greczynski, GrzegorzLinköpings universitet,Tunnfilmsfysik,Tekniska högskolan(Swepub:liu)grzgr49 (författare)
Jensen, JensLinköpings universitet,Tunnfilmsfysik,Tekniska högskolan(Swepub:liu)jenje80 (författare)
Lu, JunLinköpings universitet,Tunnfilmsfysik,Tekniska högskolan(Swepub:liu)junlu07 (författare)
Hultman, LarsLinköpings universitet,Tunnfilmsfysik,Tekniska högskolan(Swepub:liu)larhu75 (författare)
Linköpings universitetTunnfilmsfysik (creator_code:org_t)

Ingår i:Surface & Coatings Technology: Elsevier259, s. 442-4470257-89721879-3347

Av författaren/redakt...: Fager, Hanna; Greczynski, Grze ...; Jensen, Jens; Lu, Jun; Hultman, Lars

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