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Low-temperature molecular beam epitaxy growth of Si/SiGe THz quantum cascade structures on virtual substrates

Zhao, Ming (author)
Linköpings universitet,Yt- och Halvledarfysik,Tekniska högskolan
Ni, Wei- Xin (author)
Linköpings universitet,Yt- och Halvledarfysik,Tekniska högskolan
Townsend, P (author)
Cavendish Laboratory, University of Cambridge, Cambridge, UK
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Lynch, S. A. (author)
Cavendish Laboratory, University of Cambridge, Cambridge, UK
Paul, D. J. (author)
Cavendish Laboratory, University of Cambridge, Cambridge, UK
Chang, M. N. (author)
National Nano Device Laboratories, Taiwan
Hsu, C. C. (author)
National Nano Device Laboratories, Taiwan
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 (creator_code:org_t)
Elsevier BV, 2006
2006
English.
In: Thin Solid Films. - : Elsevier BV. - 0040-6090. ; 508:1-2, s. 24-28
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • Si/SiGe quantum cascade structures containing superlattice up to 100 periods have been grown on SiGe virtual substrates by using solid-source molecular beam epitaxy at low temperature. The surface morphology and structural properties of the grown samples were characterized using various experimental techniques. It has been concluded that the structures were completely symmetrically strained with high crystalline quality, precise layer parameters, and excellent reproducibility. Electroluminescence was observed with peaked intensity at 3 THz at both 4 and 40 K, which agrees very well with expected interwell intersubband transition according to the design.

Keyword

Molecular beam epitaxy (MBE); Si/SiGe; Quantum cascade; X-ray diffraction
TECHNOLOGY
TEKNIKVETENSKAP

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