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Low-temperature gro...
Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering
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- Schmidt, Susann (författare)
- Linköpings universitet,Linköping University,Tunnfilmsfysik,Tekniska fakulteten,European Spallat Source ERIC, Sweden
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- Höglund, Carina (författare)
- Linköpings universitet,Linköping University,Lund University,Lunds universitet,European Spallation Source ESS AB,Stiftelser och övriga anknutna verksamheter,Other Institutions and Utilities,Institutionen för fysik, kemi och biologi,Tekniska fakulteten,European Spallat Source ERIC, Sweden
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- Jensen, Jens (författare)
- Linköpings universitet,Linköping University,Tunnfilmsfysik,Tekniska fakulteten
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- Hultman, Lars (författare)
- Linköpings universitet,Linköping University,Tunnfilmsfysik,Tekniska fakulteten
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- Birch, Jens (författare)
- Linköpings universitet,Linköping University,Tunnfilmsfysik,Tekniska fakulteten
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- Hall-Wilton, Richard (författare)
- Mid Sweden University,Lund University,Lunds universitet,Mittuniversitetet,Avdelningen för elektronikkonstruktion,European Spallation Source ESS AB,Stiftelser och övriga anknutna verksamheter,Other Institutions and Utilities,European Spallat Source ERIC, Sweden; Mid Sweden University, Sweden
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(creator_code:org_t)
- 2016-08-01
- 2016
- Engelska.
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Ingår i: Journal of Materials Science. - New York : Springer Science and Business Media LLC. - 0022-2461 .- 1573-4803. ; 51:23, s. 10418-10428
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Abstract
Ämnesord
Stäng
- B4C coatings for 10B-based neutron detector applications were deposited using high-power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS) processes. The coatings were deposited on Si(001) as well as on flat and macrostructured (grooved) Al blades in an industrial coating unit using B4C compound targets in Ar. The HiPIMS and DCMS processes were conducted at substrate temperatures of 100 and 400 °C and the Ar pressure was varied between 300 and 800 mPa. Neutron detector-relevant coating characterization was performed and the coating properties were evaluated with regard to their growth rate, density, level of impurities, and residual coating stress. The coating properties are mainly influenced by general process parameters such as the Ar pressure and substrate temperature. The deposition mode shows only minor effects on the coating quality and no effects on the step coverage. At a substrate temperature of 100 °C and an Ar pressure of 800 mPa, well-adhering and functional coatings were deposited in both deposition modes; the coatings showed a density of 2.2 g/cm3, a B/C ratio of ~3.9, and the lowest compressive residual stresses of 180 MPa. The best coating quality was obtained in DCMS mode using an Ar pressure of 300 mPa and a substrate temperature of 400 °C. Such process parameters yielded coatings with a slightly higher density of 2.3 g/cm3, a B/C ratio of ~4, and the compressive residual stresses limited to 220 MPa.
Ämnesord
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
- NATURVETENSKAP -- Fysik -- Acceleratorfysik och instrumentering (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Accelerator Physics and Instrumentation (hsv//eng)
- NATURVETENSKAP -- Kemi -- Materialkemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Materials Chemistry (hsv//eng)
- TEKNIK OCH TEKNOLOGIER -- Materialteknik -- Annan materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering -- Other Materials Engineering (hsv//eng)
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